Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Metryx Wins Multi-System Mentor Order from Research Consortium

Abstract:
Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry.

Metryx Wins Multi-System Mentor Order from Research Consortium

BRISTOL, England | Posted on July 17th, 2007

In the facility, the tools will be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers. The Mentor demonstrated high enough throughput to be used as an inline metrology tool and because it is non-destructive it can be used directly on device wafers.

"These orders from an industry-leading R&D center clearly show the value-add mass metrology brings to semiconductor manufacturing," explained Dr. Adrian Kiermasz, CEO of Metryx, Ltd. "So many processes have a measurable mass change and the Mentor's versatility allows it to ensure process repeatability across a broad spectrum of manufacturing technologies. This makes it extremely valuable to semiconductor fabs, and in particular those working with novel processes or high product mix scenarios."

####

About Metryx, Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’s non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control. For more information on the company and its products, please visit http://www.metryx.net .

Mentor Mass Metrology

The Mentor offers an innovative mass measurement technology that is able to measure any mass change resulting from a process change with atomic level accuracy. The tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap or preventing yield loss.

The Mentor offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

Metryx will be exhibiting at SEMICON West in San Francisco, Calif., from July 17 – 19, 2007. Please visit them in the West Hall, Level 2, Booth 8157 to learn more about the Mentor and mass metrology.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz, +44 (0)127 586 6260

or
Impress Public Relations
Dave Richardson, 415-994-1423

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Analog DNA circuit does math in a test tube: DNA computers could one day be programmed to diagnose and treat disease August 25th, 2016

Silicon nanoparticles trained to juggle light: Research findings prove the capabilities of silicon nanoparticles for flexible data processing in optical communication systems August 25th, 2016

AIM Photonics Announces Release of Process Design Kit (PDK) for Integrated Silicon Photonics Design August 25th, 2016

Announcements

Forces of nature: Interview with microscopy innovators Gerd Binnig and Christoph Gerber August 26th, 2016

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Graphene under pressure August 26th, 2016

New electrical energy storage material shows its power: Nanomaterial combines attributes of both batteries and supercapacitors August 25th, 2016

Tools

Nanofiber scaffolds demonstrate new features in the behavior of stem and cancer cells August 25th, 2016

50 years after the release of the film 'Fantastic Voyage,' science upstages fiction: Science upstages fiction with nanorobotic agents designed to travel in the human body to treat cancer August 25th, 2016

University of Puerto Rico and NASA back in the news – XEI reports August 23rd, 2016

Spider silk: Mother Nature's bio-superlens August 22nd, 2016

New-Contracts/Sales/Customers

Thomas Swan and NGI announce unique partnership July 28th, 2016

Oxford Instruments and Dresden High Magnetic Field Laboratory collaborate to develop HTS magnet technology components for high field superconducting magnet systems June 29th, 2016

Nanometrics Selected for Third-Generation 3D-NAND Process Control: Atlas® Systems Extend Advanced Device Manufacturing Capability June 14th, 2016

Industrial Nanotech, Inc. Signs Agreement With and Receives First Purchase Order from Major New Customer in China June 6th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic