Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Metryx Wins Multi-System Mentor Order from Research Consortium

Abstract:
Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry.

Metryx Wins Multi-System Mentor Order from Research Consortium

BRISTOL, England | Posted on July 17th, 2007

In the facility, the tools will be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers. The Mentor demonstrated high enough throughput to be used as an inline metrology tool and because it is non-destructive it can be used directly on device wafers.

"These orders from an industry-leading R&D center clearly show the value-add mass metrology brings to semiconductor manufacturing," explained Dr. Adrian Kiermasz, CEO of Metryx, Ltd. "So many processes have a measurable mass change and the Mentor's versatility allows it to ensure process repeatability across a broad spectrum of manufacturing technologies. This makes it extremely valuable to semiconductor fabs, and in particular those working with novel processes or high product mix scenarios."

####

About Metryx, Limited
Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx’s non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control. For more information on the company and its products, please visit http://www.metryx.net .

Mentor Mass Metrology

The Mentor offers an innovative mass measurement technology that is able to measure any mass change resulting from a process change with atomic level accuracy. The tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap or preventing yield loss.

The Mentor offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

Metryx will be exhibiting at SEMICON West in San Francisco, Calif., from July 17 – 19, 2007. Please visit them in the West Hall, Level 2, Booth 8157 to learn more about the Mentor and mass metrology.

For more information, please click here

Contacts:
Metryx, Limited
Adrian Kiermasz, +44 (0)127 586 6260

or
Impress Public Relations
Dave Richardson, 415-994-1423

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Exploring phosphorene, a promising new material April 29th, 2016

Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016

University of Illinois researchers create 1-step graphene patterning method April 27th, 2016

NREL theory establishes a path to high-performance 2-D semiconductor devices April 27th, 2016

Announcements

Personal cooling units on the horizon April 29th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

Arrowhead Pharmaceuticals Files for Regulatory Clearance to Begin Phase 1/2 Study of ARC-521 April 28th, 2016

The Translational Research Center at the University Hospital of Erlangen in Germany uses the ZetaView from Particle Metrix to quantify extracellular vesicles such as exosomes April 28th, 2016

Tools

Exploring phosphorene, a promising new material April 29th, 2016

JPK reports on the use of a NanoWizard AFM system at the University of Kaiserslautern to study the interaction of bacteria with microstructured surfaces April 28th, 2016

Chemists use DNA to build the world's tiniest thermometer April 27th, 2016

Bruker Introduces Dimension FastScan Pro Industrial AFM: Providing Nanometer-Resolution at High Scan Rates for up to 300-mm Samples April 26th, 2016

New-Contracts/Sales/Customers

Nanometrics Achieves Record 3D-NAND Bookings Quarter: A Record 3D-NAND Bookings Quarter, both in Aggregate and for Each of Three Key Customers March 28th, 2016

Keystone Nano selected by National Cancer Institute to participate in BIO March 23rd, 2016

Heriot-Watt's Institute of Photonics & Quantum Sciences uses the Deben Microtest 2 kN tensile stage to characterise ceramics and engineering plastics January 21st, 2016

Industrial Nanotech, Inc. Begins Supplying One of World's Largest Pulp and Paper Product Companies with Patented Energy Saving and Protective Coatings for Heat Process Equipment January 4th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic