Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > FEI introduces Expida - advanced wafer DualBeamT with S/TEM

Abstract:
Expida™ 1255S Delivers Ultra-High-Resolution Analysis for Multiple Wafer Samples with High Throughput and Single System Simplicity

FEI introduces Expida - advanced wafer DualBeamT with S/TEM

HILLSBORO, OR | Posted on June 11th, 2007

Following the success of its popular Expida™ 1255 wafer DualBeam™ system for semiconductor labs, FEI Company (Nasdaq: FEIC) has introduced the next-generation tool in the product family, the Expida 1255S. It is the first, and only, wafer DualBeam system to integrate wafer level STEM (scanning/transmission electron microscopy) sample preparation with ultra-high-resolution imaging and analysis in a single tool. The Expida 1255S features an advanced ion beam column for preparing TEM samples, and an enhanced electron column with a 14-segment STEM detector for high-resolution 30kV imaging.



Until now, advanced sample preparation and handling often caused frustrating delays and required the use of multiple systems and processes to create high-quality TEM samples. The Expida 1255S assures correct end-pointing and precise lamella thickness by enabling STEM imaging while milling the TEM sample to its final location and required thickness.



The new Expida system uniquely addresses the requirements of high-throughput STEM imaging and analysis for sub-45 nanometer process control. With its speed, accuracy and integrated operation, the Expida 1255S delivers complete sets of data faster, and ultimately delivers faster time to market and a faster ramp to volume production.



"Semiconductor labs supporting process control for volume manufacturing have often been caught in a bind," explains Tony Edwards, vice president of FEI's NanoElectronics market division. "Time-efficient SEM tools lacked the necessary magnification and resolutions for today's device designs while higher-resolution STEM and TEM systems required time-consuming sample preparation. FEI's innovations in DualBeam and electron microscopy have enabled us to deliver this faster and simpler solution for semiconductor manufacturers."



The new Expida 1255S STEM along with FEI's entire suite of time- and cost-saving solutions for semiconductor manufacturers will be featured at SEMICON West, July 17-19, (Booth 2120, South Hall) at San Francisco's Moscone Center.

####

About FEI Company
FEI (Nasdaq: FEIC) is a global leader in providing innovative instruments for nanoscale imaging, analysis and prototyping. FEI focuses on delivering solutions that provide groundbreaking results and accelerate research, development and manufacturing cycles for its customers in Semiconductor and Data Storage, Academic and Industrial R&D, and Life Sciences markets. With R&D centers in North America and Europe, and sales and service operations in more than 50 countries around the world, FEI’s Tools for Nanotech™ are bringing the nanoscale within the grasp of leading researchers and manufacturers. More information can be found online at http://www.fei.com .

This news release contains forward-looking statements about a new DualBeam product and its capabilities and possible benefits. Factors that could affect these forward-looking statements include but are not limited to delays in the roll-out of the product, manufacturing or delivery delays and failure of the product to perform as expected due to technical or other reasons. Please also refer to our Form 10-K, Forms 10-Q, Forms 8-K and other filings with the U.S. Securities and Exchange Commission for additional information on these factors and other factors that could cause actual results to differ materially from the forward-looking statements. FEI assumes no duty to update forward-looking statements.

For more information, please click here

Contacts:
Dan Zenka, APR
Global Public Relations
FEI Company
+1 503 726 2695

Copyright © FEI

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Graphene under pressure August 26th, 2016

Stretchy supercapacitors power wearable electronics August 25th, 2016

AIM Photonics Announces Release of Process Design Kit (PDK) for Integrated Silicon Photonics Design August 25th, 2016

Tools

Nanofiber scaffolds demonstrate new features in the behavior of stem and cancer cells August 25th, 2016

50 years after the release of the film 'Fantastic Voyage,' science upstages fiction: Science upstages fiction with nanorobotic agents designed to travel in the human body to treat cancer August 25th, 2016

University of Puerto Rico and NASA back in the news – XEI reports August 23rd, 2016

Spider silk: Mother Nature's bio-superlens August 22nd, 2016

Events/Classes

Stretchy supercapacitors power wearable electronics August 25th, 2016

Semblant to Present at China Mobile Manufacturing Forum 2016 August 25th, 2016

Nanoparticles that speed blood clotting may someday save lives August 23rd, 2016

Impressive List of Doctors, Scientists Coming to Vail for Scientific Summit: The Second Vail Scientific Summit Convenes the Greatest Minds in Regenerative Medicine and Science August 17th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic