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Home > News > Xyalis Announce an Advanced Methodology for Building CMP Models

June 1st, 2007

Xyalis Announce an Advanced Methodology for Building CMP Models

Abstract:
XYALIS announce today that thanks to 'non destructive' nanometric measurement equipment's, XYALIS is able to build Chermo Mechanical Planarization (CMP) models. These models are used for estimating the critical areas where dummy filling is needed to smooth the thickness variation. With advanced processes starting at 65nm and below, using a model based estimator is a must to find critical areas and reduce the number of dummy tiles inserted and thus, reduce the parasitics and yield lost. This measures are available within a collaboration of XYALIS and CIME - Nanotech (Minatec Research Center) in Grenoble.

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