Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH-Backed Research on Novel Materials Holds Key to Extending Immersion Lithography, Consortium Experts Tell SPIE Attendees

Abstract:
Backed Research on Novel Materials Holds Key to Extending Immersion Lithography, Consortium Experts Tell SPIE Attendees.

SEMATECH-Backed Research on Novel Materials Holds Key to Extending Immersion Lithography, Consortium Experts Tell SPIE Attendees

San Jose, CA | Posted on March 8th, 2007

The future of 193 nm immersion (193i) lithography will be driven by the demonstration of a high-index lens material, invention of a third generation immersion fluid, and development of a high-index photoresist, SEMATECH-sponsored scientists reported at last week's SPIE Advanced Lithography Symposium.

These technology initiatives, all being spearheaded by SEMATECH through R&D agreements spanning three continents, were detailed in four papers and associated meetings during SPIE. Presenters reported steady progress in preparing key materials for extending 193i past the 45 nm technology generation, where it will first be employed. These results also will allow SEMATECH members and the semiconductor industry to make critical decisions regarding the ability to assess the extensibility of 193i by the end of 2007.

Emerging as a promising 193i lens material is lutetium aluminum garnet (LuAG), a crystalline mineral first identified in 2005 through SEMATECH-supported research at the National Institute of Standards and Technology (NIST). LuAG is attractive to lithographers because of its high refractive index of 2.14, compared to 1.56 for fused silica lenses currently used in semiconductor exposure tools. The higher index can be used to produce a larger numerical aperture (NA), which in turn can help utilize 193 nm light to define microcircuits much narrower than the wavelength.

Consequently, SEMATECH has launched a joint development agreement with Germany's Schott Lithotec to develop mid-sized, projection-quality LuAG lens elements with a diameter of 80 mm. These prototypes will establish the framework to test the feasibility of full-scale LuAG lenses, which will need to be around 150 mm in diameter for high-volume manufacturing.

The project's goal is to produce a LuAG lens in 2009 to support beta exposure tools that could become available in 2010. At a SEMATECH-sponsored materials review, all three major exposure tool-makers reported that the crystal's drawback of moderate intrinsic birefringence, which distorts light waves, could be corrected for manufacturing. And Schott representative Dr. Lutz Parthier predicted that his company would produce a production-worthy lens-blank by 2009. "All available test results don't reveal any technical showstoppers" to this goal, he said.

Analysis of second- and third-generation immersion fluids likewise produced a set of hopes and challenges. Several companies have revealed hydrocarbon based fluids having a refractive index between than 1.6 and 1.7. However, such fluids darken under laser irradiation, and leave residue on the lens surface. Also, ways must be found to prevent advanced fluids - which typically are viscous - from leaving behind microscopic droplets during removal.

SEMATECH is addressing these issues through support of research groups at MIT Lincoln Laboratory and at the University of Wisconsin. In addition, through three universities, SEMATECH is pursuing approaches to third generation fluids - based on nanocomposites, carbon-ring organics and hetero-compounds - with refractive indexes above 1.8.

Separately, SEMATECH sponsored research at the University of Queensland in Australia has recently developed a sulfur-based platform to demonstrate the first imaging with a resist index of 1.76. High-index resist offers the possibility of extending 193i even further, and developing a broader process window as well.

"We need to make the technology for these future generations available in the next 10 ˝ months-that's our mission," said Bryan Rice, manager of SEMATECH's 193i program. "We need to offer a choice of technologies to semiconductor manufacturers."

####

About SEMATECH
For 20 years, SEMATECH® ( http://www.sematech.org ) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Dan McGowan
512-356-3440

Copyright © SEMATECH®

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

Announcements

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

Research partnerships

Made-in-Singapore rapid test kit detects dengue antibodies from saliva: IBN's MedTech innovation simplifies diagnosis of infectious diseases January 29th, 2015

Carbon nanoballs can greatly contribute to sustainable energy supply January 27th, 2015

Visualizing interacting electrons in a molecule: Scientists at Aalto University and the University of Zurich have succeeded in directly imaging how electrons interact within a single molecule January 26th, 2015

Promising use of nanodiamonds in delivering cancer drug to kill cancer stem cells: NUS study shows that delivery of Epirubicin by nanodiamonds resulted in a normally lethal dosage of Epirubicin becoming a safe and effective dosage for treatment of liver cancer January 26th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE