Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > UAlbany Nanocollege reports breakthrough in production of exposed images using ASML EUV R&D lithography tool

Abstract:
Presentation at SPIE conference unveils development at CNSE's Albany NanoTech complex

UAlbany Nanocollege reports breakthrough in production of exposed images using ASML EUV R&D lithography tool

Albany, NY | Posted on March 1st, 2007

Less than six months after taking delivery of the world's first full-field extreme ultraviolet ("EUV") research and development tool ("ADT"), the College of Nanoscale Science and Engineering ("CNSE") of the University at Albany today announced that it has produced the world's first exposed images while using the tool.

The announcement came during a presentation at the International Society for Optical Engineering ("SPIE") Advanced Lithography 2007 conference in San Jose, CA.

The $65 million EUV ADT, developed by Netherlands-based ASML Holding NV ("ASML"), the leading global supplier of advanced lithography tools, will be essential in development of the infrastructure for EUV lithography, considered the most likely technology for insertion into manufacturing as early as the 32nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.

The production of images from the EUV ADT supports the R&D programs of the $600M International Venture for Nanolithography ("INVENT"), a global industry-university consortium for R&D, education and technology deployment for future generations of nanolithography applications. INVENT was created with critical support and enabling assistance from the New York State Assembly, led by Speaker Sheldon Silver, and includes the world's leading computer-chip manufacturers: Advanced Micro Devices ("AMD"), IBM, Micron Technology and Qimonda. Other global corporate partners of CNSE, including SONY and Toshiba, also participate in the CNSE EUV programs.

"This is an exciting development not only for the College of Nanoscale Science and Engineering, but also for the New York State Assembly. This groundbreaking achievement speaks volumes about the college's highly skilled team of scientists and technicians and the potential economic and job-development opportunities we can expect from the Assembly's investment in this revolutionary technology," said Assembly Speaker Sheldon Silver.

"This milestone is a testament to the leadership of Speaker Silver and Dr. Kaloyeros and it is especially rewarding for all of us in the Assembly Majority to be such an instrumental part of this innovative process that is sure to solidify Tech Valley's position as a leader driving the field of nanoscience," said Assembly Majority Leader Ron Canestrari.

"Today's successful demonstration of the EUV tool by the College of Nanoscale Science and Engineering holds much promise for our region of the state and its residents. We look forward to additional announcements on improving our economy and employment opportunities and building on today's impressive high-tech achievement," said Assemblyman Jack McEneny.

"This latest achievement of the College of Nanoscale Science and Engineering again confirms the status of the university and its governmental and private partners as worldwide leaders in nanoelctronics. In addition, it continues to demonstrate the critical movement from research to viable manufacturing, which confirms the viability of our investment," said Assemblyman Robert Reilly.

"The production of the world's first EUV images using the ASML R&D tool in a development environment is proof positive that the UAlbany NanoCollege and New York State are providing global leadership that is not only attracting the world's leading nanoelectronics companies and the industry's cutting-edge tools, but more importantly, allowing both to succeed," said Dr. Alain E. Kaloyeros, Vice President and Chief Administrative Officer of CNSE. "This breakthrough underscores the innovative research being conducted through a host of programs at CNSE, as typified by our global INVENT consortium, a vision of Speaker Silver, Assemblyman Canestrari, Assemblyman McEneny, Assemblyman Reilly and the New York Assembly, which is providing important scientific discovery, critical workforce education and training, and a strong lure to attract additional nanoelectronics jobs, companies and investment to New York State."

"The UAlbany NanoCollege has taken another step forward as the world's first educational and research institution to produce images with the EUV Alpha Demo Tool, in the process providing a critical advance toward the commercialization of EUV technology," said Dr. James Ryan, Professor of Nanoscience and Associate Vice President of Technology at CNSE. "Combined with the availability of EUV photomasks, ASML's earlier demonstration of operating wafer and reticle stages in a vacuum environment and the presence of a critical mass of nanoelectronics tool suppliers and chip manufacturers at CNSE, we look forward to leading the way in the development and commercialization of EUV technology."

ASML has a $400 million R&D center at the New York State Center of Excellence in Nanoelectronics and Nanotechnology at CNSE's Albany NanoTech complex - the International Multiphase Partnership for Lithography Science and Engineering ("IMPLSE") - designed to develop nanoscale lithography technologies for future generations of nanochips. The establishment of the ASML R&D Center represents ASML's only 300mm wafer R&D facility located outside of its main headquarters in the Netherlands.

####

About CNSE-University of Albany
The UAlbany CNSE is the first college in the world dedicated to research, development, education, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. In May 2006, it was ranked as the nation’s number one college for nanotechnology and microtechnology in the Annual College Ranking by Small Times magazine. CNSE’s Albany NanoTech complex is the most advanced research facility of its kind at any university in the world: a $3.5 billion, 450,000-square-foot complex that attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 65,000 square feet of Class 1 capable cleanrooms. Over 1,600 scientists, researchers, engineers, students, and faculty work on site at CNSE’s Albany NanoTech complex, including IBM, AMD, SONY, Toshiba, Qimonda, Honeywell, ASML, Applied Materials, Tokyo Electron, and Freescale. An expansion currently underway will increase the size of CNSE’s Albany NanoTech complex to over 750,000 square feet, including over 80,000 square feet of Class 1 cleanroom space, to house over 2,000 scientists, researchers, engineers, students, and faculty by the end of 2008.

For more information, please click here

Contacts:
Steve Janack
Director of Communications
(phone) 518-956-7322
(cell) 518-312-5009
(e-mail)

Copyright © University of Albany

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Academic/Education

Graphene: Progress, not quantum leaps May 23rd, 2016

Smithsonian Science Education Center and National Space Society Team Up for Next-Generation Space Education Program "Enterprise In Space" May 11th, 2016

The University of Colorado Boulder, USA, combines Raman spectroscopy and nanoindentation for improved materials characterisation May 9th, 2016

Albertan Science Lab Opens in India May 7th, 2016

Nanoelectronics

Researchers demonstrate size quantization of Dirac fermions in graphene: Characterization of high-quality material reveals important details relevant to next generation nanoelectronic devices May 20th, 2016

Graphene: A quantum of current - When current comes in discrete packages: Viennese scientists unravel the quantum properties of the carbon material graphene May 20th, 2016

New type of graphene-based transistor will increase the clock speed of processors: Scientists have developed a new type of graphene-based transistor and using modeling they have demonstrated that it has ultralow power consumption compared with other similar transistor devices May 19th, 2016

Self-healing, flexible electronic material restores functions after many breaks May 17th, 2016

Discoveries

Simple attraction: Researchers control protein release from nanoparticles without encapsulation: U of T Engineering discovery stands to improve reliability and fabrication process for treatments to conditions such as spinal cord damage and stroke May 28th, 2016

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Finding a new formula for concrete: Researchers look to bones and shells as blueprints for stronger, more durable concrete May 26th, 2016

Announcements

Simple attraction: Researchers control protein release from nanoparticles without encapsulation: U of T Engineering discovery stands to improve reliability and fabrication process for treatments to conditions such as spinal cord damage and stroke May 28th, 2016

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Doubling down on Schrödinger's cat May 27th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

Tools

Scientists illuminate a hidden regulator in gene transcription: New super-resolution technique visualizes important role of short-lived enzyme clusters May 27th, 2016

Light can 'heal' defects in new solar cell materials: Defects in some new electronic materials can be removed by making ions move under illumination May 24th, 2016

More light on cancer: Scientists created nanoparticles to highlight cancer cells May 21st, 2016

Nanotubes are beacons in cancer-imaging technique: Rice University researchers use spectral triangulation to pinpoint location of tumors May 21st, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic