Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Energetiq EUV Light Source Installed on CEA-Leti Research Tool

Abstract:
Electrodeless Z-Pinch EUV System Used in Photoresist Outgassing Studies

Energetiq EUV Light Source Installed on CEA-Leti Research Tool

WOBURN, MA | Posted on February 28th, 2007

Energetiq Technology, Inc., a developer and manufacturer of specialized short
wavelength light products for use in advanced technology applications, has announced
that the company's EQ- 10 Extreme Ultraviolet (EUV) Light Source is being used on a
new experimental tool developed by CEA-Leti in studies to characterize
photoresist outgassing during exposure in EUV lithography processes. The
10-Watt EUV source utilizes Energetiq's patented Electrodeless Z-Pinch(TM)
technology and is fast becoming the standard source used for EUV
infrastructure development.

CEA-Leti, a laboratory of the Minatec(R) Pole of innovation in
Grenoble, France operated by the Technology Research Directorate of the
French Atomic Energy Commission (CEA), has been pioneering research on EUV
lithography since 1999. "The collaboration with Energetiq has allowed us to
set up an outgassing tool which is essential for resist qualification and
optic contamination studies and strengthens our capacity to support our
collaborative programs with resists and materials suppliers," comments Dr.
Serge Tedesco, Lithography Program Manager at CEA-Leti. "Moreover, this
system is of prime importance in the development of new resist platforms
foreseen for the 22nm hp node," he added.

"We are delighted to install our first light source in Europe at the
world-class CEA-Leti research center," said Deborah Gustafson, Vice
President of Sales and Service for Energetiq. "Our technology easily
integrated into their existing system and the stable EUV power output has
enabled them to quickly begin their research." Using inert Xenon gas, the
compact EQ-10 creates a small bright EUV emitting plasma which produces
ample EUV power for photoresist outgassing studies.

EUV lithography is a leading candidate for next generation lithography
because of its capability of printing features of 32nm and below, covering
the needs of the semiconductor industry well into the next decade.

Energetiq's EQ-10 light source employs a patented electrode-free
technology that inductively couples the current into the discharge plasma,
making it extremely stable and controllable. The plasma is confined away
from source components, minimizing heat load and reducing debris.

####

About Energetiq Technology, Inc.
Energetiq, based in Woburn, Massachusetts, was founded in March 2004
with a mission to be the preeminent developer and manufacturer of short
wavelength light sources for use in the analysis and fabrication of
nano-scale structures and products. Members of the Energetiq team have been
responsible for developing many high power plasma sources that run daily in
semiconductor fabrication facilities around the world. Energetiq's goal is
to leverage this expertise to develop novel, cost-effective, short
wavelength light sources that enable the production of next generation
devices. The company's products cover the Deep Ultraviolet (DUV), Extreme
Ultraviolet (EUV) and Soft X-Ray (SXR) wavelength range from 400nm to 1nm
(nanometer) and can be used in lithography, metrology, inspection, resist
and thin-film processing and R&D applications.

About CEA-Leti

The CEA, a public organization for technological research, carries out
its missions in the domains of energy, information and health technologies
and defense, building on the foundations of fundamental research at the
highest level. Strengthened by the competence of its 15,000 researchers and
collaborators, it is recognized internationally and constitutes a strong
source of original ideas for public authorities, institutions and
industries in France and in Europe. Located in Grenoble, CEA-Leti is at the
leading edge of European research in microelectronics, microtechnology and
nanotechnology. It employs nearly 1000 people and deposits around 200
patents per year. With 28 start-ups created or in the course of creation,
it is one of the most important partners of the industrial world. For
further information: http://www.cea.fr .

For more information, please click here

Contacts:
7 Constitution Way
Woburn, MA 01801
Phone: +1 (781) 939-0763
Fax: +1 (781) 939-0769
Email:

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Steam from the sun: New spongelike structure converts solar energy into steam July 21st, 2014

More than glitter: Scientists explain how gold nanoparticles easily penetrate cells, making them useful for delivering drugs July 21st, 2014

Iran to Host 1st Asian Congress on Nanostructures on Kish Island July 21st, 2014

Tools

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

Sono-Tek Corporation Announces New Clean Room Rated Laboratory Facility in China July 18th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE