Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

Abstract:
Nikon Corporation announced today a Joint Development Program with CEA-Leti, one of Europe's leading microelectronics research centers focused on optical lithography development for technology beyond 45 nm. The work will examine the potential of Double Exposure and Double Patterning for 32 nm semiconductor devices, and will utilize a leading-edge Nikon scanner located in CEA-Leti's Nanotec 300 research facility.

Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

BELMONT, CA | Posted on February 27th, 2007

Double Patterning was added to the ITRS roadmap in 2006 as a potential solution for 32 nm lithography. EUVL and high-index immersion are also listed as potential solutions on the ITRS roadmap, but the development timeline for those technologies may limit them from being used for 32 nm applications. Nikon is working with key research centers and leading-edge IC manufacturers, as well as partnering with design, mask, and resist companies to ensure a manufacturable solution is available in time for the 32 nm node.

"CEA-Leti offers an outstanding, state-of-the-art facility with all of the processes required for Double Patterning," stated Toshikazu Umatate, Executive Officer, Precision Equipment Company, Nikon Corporation. "Our collaboration with Leti enables us to leverage their process expertise and our lithography knowledge to develop the best exposure tools and processes for this challenging technology."

"The partnership with Nikon is a great opportunity to develop all aspects of Double Processing with one of the world's leading equipment suppliers," said Olivier Demolliens, head of the Nanotec Division at CEA-Leti. "DE/DP is the main solution foreseen for the 32 nm node, bridging the gap between immersion and EUV, but there are still a lot of issues that need to be addressed on equipment, process, mask and CAD. Together with Nikon equipment and expertise, we have built a consortium that will address all these developments."

####

About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,800 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. For more information about Nikon, access our web site at http://www.nikon.co.jp .

About CEA-Leti

The CEA (French Atomic Energy Commission), a public organization for technological research, carries out its missions in the domains of energy, information and health technologies, and defense, building on the foundations of fundamental research at the highest level. Strengthened by the competence of its 15,000 researchers and collaborators, it is recognized internationally and constitutes a strong source of original ideas for public authorities, institutions, and industries in France and in Europe.

Located in Grenoble, CEA-Leti (Electronics and Information Technology Laboratory of the French Atomic Energy Commission) is at the leading edge of European research in microelectronics, microtechnology and nanotechnology. It employs nearly 1000 people and generates around 200 patents per year. With 28 start-ups created or in the course of creation, it is one of the most important partners of the industrial world. Instigator of the MINATEC® pole of innovation, CEA-Leti is also one of its principal partners, beside the INP Grenoble (Grenoble Institute of Technology) and the local authorities.

For more information about CEA , access http://www.cea.fr .

For more information, please click here

Contacts:
Nikon Precision Inc.
Bernie Wood, Director of Marketing, 650-413-8533

Copyright © Business Wire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Particles from outer space are wreaking low-grade havoc on personal electronics February 19th, 2017

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

Research opens door to smaller, cheaper, more agile communications tech February 16th, 2017

Research reveals novel quantum state in strange insulating materials February 14th, 2017

Announcements

Particles from outer space are wreaking low-grade havoc on personal electronics February 19th, 2017

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

Engineers shrink microscope to dime-sized device February 17th, 2017

Francis Alexander Named Deputy Director of Brookhaven Lab's Computational Science Initiative February 16th, 2017

Tools

Engineers shrink microscope to dime-sized device February 17th, 2017

Metamaterial: Mail armor inspires physicists: KIT researchers reverse hall coefficient -- medieval mail armor inspired development of metamaterial with novel properties February 15th, 2017

Cedars-Sinai, UCLA Scientists Use New ‘Blood Biopsies’ With Experimental Device to Speed Cancer Diagnosis and Predict Disease Spread: Leading-Edge Research Is Part of National Cancer Moonshot Initiative February 13th, 2017

Meta-lenses bring benchtop performance to small, hand-held spectrometer: Game-changing nanostructure-based lenses allow smaller devices, increased functionality February 9th, 2017

Alliances/Trade associations/Partnerships/Distributorships

Leti Coordinating Project to Adapt Obstacle-Detection Technology Used in Autonomous Cars for Portable and Wearable Systems: INSPEX to Combine Knowhow of Nine European Organizations to Create Portable and Wearable Spatial-Exploration Systems February 2nd, 2017

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project