Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

Abstract:
Nikon Corporation announced today a Joint Development Program with CEA-Leti, one of Europe's leading microelectronics research centers focused on optical lithography development for technology beyond 45 nm. The work will examine the potential of Double Exposure and Double Patterning for 32 nm semiconductor devices, and will utilize a leading-edge Nikon scanner located in CEA-Leti's Nanotec 300 research facility.

Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

BELMONT, CA | Posted on February 27th, 2007

Double Patterning was added to the ITRS roadmap in 2006 as a potential solution for 32 nm lithography. EUVL and high-index immersion are also listed as potential solutions on the ITRS roadmap, but the development timeline for those technologies may limit them from being used for 32 nm applications. Nikon is working with key research centers and leading-edge IC manufacturers, as well as partnering with design, mask, and resist companies to ensure a manufacturable solution is available in time for the 32 nm node.

"CEA-Leti offers an outstanding, state-of-the-art facility with all of the processes required for Double Patterning," stated Toshikazu Umatate, Executive Officer, Precision Equipment Company, Nikon Corporation. "Our collaboration with Leti enables us to leverage their process expertise and our lithography knowledge to develop the best exposure tools and processes for this challenging technology."

"The partnership with Nikon is a great opportunity to develop all aspects of Double Processing with one of the world's leading equipment suppliers," said Olivier Demolliens, head of the Nanotec Division at CEA-Leti. "DE/DP is the main solution foreseen for the 32 nm node, bridging the gap between immersion and EUV, but there are still a lot of issues that need to be addressed on equipment, process, mask and CAD. Together with Nikon equipment and expertise, we have built a consortium that will address all these developments."

####

About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,800 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. For more information about Nikon, access our web site at http://www.nikon.co.jp .

About CEA-Leti

The CEA (French Atomic Energy Commission), a public organization for technological research, carries out its missions in the domains of energy, information and health technologies, and defense, building on the foundations of fundamental research at the highest level. Strengthened by the competence of its 15,000 researchers and collaborators, it is recognized internationally and constitutes a strong source of original ideas for public authorities, institutions, and industries in France and in Europe.

Located in Grenoble, CEA-Leti (Electronics and Information Technology Laboratory of the French Atomic Energy Commission) is at the leading edge of European research in microelectronics, microtechnology and nanotechnology. It employs nearly 1000 people and generates around 200 patents per year. With 28 start-ups created or in the course of creation, it is one of the most important partners of the industrial world. Instigator of the MINATEC® pole of innovation, CEA-Leti is also one of its principal partners, beside the INP Grenoble (Grenoble Institute of Technology) and the local authorities.

For more information about CEA , access http://www.cea.fr .

For more information, please click here

Contacts:
Nikon Precision Inc.
Bernie Wood, Director of Marketing, 650-413-8533

Copyright © Business Wire

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Surface matters: Huge reduction of heat conduction observed in flat silicon channels April 23rd, 2015

Drexel materials scientists putting a new spin on computing memory April 22nd, 2015

Printing Silicon on Paper, with Lasers April 21st, 2015

Advances in molecular electronics: Lights on -- molecule on: Researchers from Dresden and Konstanz succeed in light-controlled molecule switching April 20th, 2015

Announcements

Heat makes electrons’ spin in magnetic superconductors April 26th, 2015

QD Vision Wins 2015 Bronze Edison Award for Color IQ™ Quantum Dot Technology April 26th, 2015

SEFCU, SUNY Poly CNSE Announce Winning Student-Led Teams in the 6th Annual $500,000 New York Business Plan Competition April 25th, 2015

Northwestern scientists develop first liquid nanolaser: Technology could lead to new way of doing 'lab on a chip' medical diagnostics April 25th, 2015

Tools

Fast and accurate 3-D imaging technique to track optically trapped particles April 24th, 2015

ORNL reports method that takes quantum sensing to new level April 23rd, 2015

Quantum 'paparazzi' film photons in the act of pairing up April 22nd, 2015

Richards-Kortum elected to American Academy of Arts and Sciences: April 22nd, 2015

Alliances/Partnerships/Distributorships

How can you see an atom? (video) April 10th, 2015

FibeRio and VF Corporation Form Strategic Partnership to Lead the Apparel and Footwear Markets in Nanofiber Technology April 8th, 2015

UK National Graphene Institute Selects Bruker as Official Partner: World-Leading Graphene Research Facility Purchases Multiple Bruker AFMs April 7th, 2015

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project