Nanotechnology Now

Our NanoNews Digest Sponsors







Heifer International

Wikipedia Affiliate Button


Home > Press > Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Abstract:
Canon Marketing Japan (President : Haruo Murase) is pleased to announce that it has signed an exclusive distribution agreement with Obducat (CEO : Patrik Lundstrom). The agreement gives CMJ the exclusive rights to sell Obducat's Nano Imprint Lithography equipment in Japan. Canon Marketing Japan will start marketing the equipment from March 1st, 2007 and enter into the new marketplace of nanoimprint equipment.

Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Sweden and Japan | Posted on February 9th, 2007

NIL equipments, by pressing stampers to resist coated on substrates, enable transferring small feature pattern to optical components etc in the nanometer range and realize cost efficient pattern replication compared to existing photolithography equipments.

Nowadays, in line with the miniaturization and multifunctional capability of optical components such as polarizing elements, microlens arrays and LEDs or the density growth in storage devices such as magnetic or optical disks, needs for creating fine patterns to all kinds of substrates is growing. CMJ, having been marketing various equipments, including semiconductor-manufacturing equipments, LCD panel manufacturing equipments and measurement equipments, to the leading-edge industry, will further expand its business in the Industrial area with the new release of the nanoimprint equipment.

Obducat' NIL equipment, utilizes Obducat's proprietary "SoftPressTM " technology, which enables air pressure to be evenly distributed, ensuring a uniform and thin pattern over substrates. In addition, Obducat's "STUTM (Simultaneous Thermal and UVTM)" technology enables simultaneously combined UV and thermal NIL, allowing precise imprint to substrates. The patented "IPS (Intermediate Polymer Stamp)" imprint process enables contamination control and increases the stamp lifetime through a two-step
process where the contact between the master stamp and the hard substrate is avoided.

Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.
[key benefit]
● Soft Press TM technology : Full area uniform imprint
● STUTM (Simultaneous Thermal and UVTM) technology : Precise pattern transfer
● IPSTM (Intermediate Polymer StampTM) technology : Yield improvement

1. Soft Press Technology™ Full area uniform imprint Realizes uniform imprint by pressing stampers against substrates with air pressure. The use of Soft Press™ ensures parallelism between stamp and substrate, resulting in a thin and uniform residual layer at better than +/- 10 nm and is independent of substrate size shape and waviness.

2. STU™ - Simultaneous Thermal and UV™ Precise pattern transfer Obducat's proprietary STU™ technology enables simultaneously combined UV and thermal NIL, allowing imprint to UV-curable thermoplastic pre-polymers at a constant temperature. The method has been developed in order to overcome problems generating from the difference in thermal expansions between stamps and substrates. The method allows the use of spin-coated UV-curable polymers with a homogeneous thickness distribution on wafer scale, crucial for CD control and enabling pattern transfer to an
underlying substrate.

3. IPS™ - Intermediate Polymer Stamp™ Yield improvement This IPSTM technology was developed to solve the several concerns pointed out in the method which stampers directly touch substrates. The IPSTM technology enables contamination control, increases the stamp lifetime and avoids breakage, through a twostep process where the contact between the master stamp and the hard substrate is avoided. Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.

4. Auto transfer capabilities of substrate and stamper
Imprint under clean environment
Respective pod stages for both substrates and stamps enable to correspond to mini environment method. By using the private robot for auto transfer, risk of breakage during transportation and the contamination risk are alleviated. By equipping ULPA filter within the system, the transportation area of the substrates and stampers can be maintained at a class 10 level clean environment. Controlling contamination with the IPS™ technology and the pod function ensures improving yield.

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

Obducat develops and sells lithography solutions for production and replication of advanced micro- and nanostructures for industrial mass production and for research and development. Sales include equipment, stampers, process optimization, and licenses. Obducat also offers Scanning electron microscopes for metrology purposes.

For more information, please click here

Contacts:
Obducat AB
P.O. Box 580
201 25 Malmö
SWEDEN
Geijersgatan 2A, 216 18 Malmö
Phone: +46 40 362100
Fax: +46 40 362160
E-mail:

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

Atomic-Scale Investigations Solve Key Puzzle of LED Efficiency: MIT and Brookhaven Lab scientists use electron microscopy imaging techniques to settle a solid-state controversy and raise new experimental possibilities May 22nd, 2013

Single-Cell Transfection Tool Enables Added Control for Biological Studies: McCormick researchers develop method of delivering molecules into targeted cells May 22nd, 2013

International survey supports need for built-in water protection on smartphones and tablets May 21st, 2013

Rice unveils method for tailoring optical processors: Arranging nanoparticles in geometric patterns allows for control of light with light May 21st, 2013

Tools

Atomic-Scale Investigations Solve Key Puzzle of LED Efficiency: MIT and Brookhaven Lab scientists use electron microscopy imaging techniques to settle a solid-state controversy and raise new experimental possibilities May 22nd, 2013

Xmark Media announces the 2013 Vacuum Expo & Vacuum Symposium, Ricoh Arena - Coventry 16-17 October May 21st, 2013

JPK reports on single molecule research at IISER Pune in India using AFM and CellHesion techniques May 21st, 2013

Penn engineers' nanoantennas improve infrared sensing May 20th, 2013

Alliances/Partnerships/Distributorships

Imec and GLOBALFOUNDRIES collaborate to advance high-density memory technology: STT-MRAM offers enhanced performance and scalability for embedded and standalone applications May 21st, 2013

NIA Public Briefing: Nanotechnology and the Council of Europe May 17th, 2013

Imec and Renesas collaborate on ultra-low power short range radios: Collaboration will develop robust wireless solutions for future electronics May 16th, 2013

HELIOS Program Develops Complete Supply Chain for Integrating Photonics with CMOS Circuit via IC Fabrication Processes May 14th, 2013

New-Contracts/Sales/Customers

Harris & Harris Group Notes the Sale of a Second D-Wave Quantum Computer May 16th, 2013

Industrial Nanotech Announces 3300 Gallon Nansulate(R) Crystal Order - First of Five Orders Expected to Total Over 15,000 Gallons May 13th, 2013

Robert Bosch GmbH places order for SolMateS' Pulsed Laser Deposition system March 1st, 2013

JPK reports on the applied research of Ioan Notingher at the University of Nottingham using AFM and the Tip Assisted Optics module to study individual nanotubes and fibrils. February 27th, 2013

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project








abbigliamento uomo
Computer Accessories
© Copyright 1999-2013 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE