Nanotechnology Now





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Abstract:
Canon Marketing Japan (President : Haruo Murase) is pleased to announce that it has signed an exclusive distribution agreement with Obducat (CEO : Patrik Lundstrom). The agreement gives CMJ the exclusive rights to sell Obducat's Nano Imprint Lithography equipment in Japan. Canon Marketing Japan will start marketing the equipment from March 1st, 2007 and enter into the new marketplace of nanoimprint equipment.

Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Sweden and Japan | Posted on February 9th, 2007

NIL equipments, by pressing stampers to resist coated on substrates, enable transferring small feature pattern to optical components etc in the nanometer range and realize cost efficient pattern replication compared to existing photolithography equipments.

Nowadays, in line with the miniaturization and multifunctional capability of optical components such as polarizing elements, microlens arrays and LEDs or the density growth in storage devices such as magnetic or optical disks, needs for creating fine patterns to all kinds of substrates is growing. CMJ, having been marketing various equipments, including semiconductor-manufacturing equipments, LCD panel manufacturing equipments and measurement equipments, to the leading-edge industry, will further expand its business in the Industrial area with the new release of the nanoimprint equipment.

Obducat' NIL equipment, utilizes Obducat's proprietary "SoftPressTM " technology, which enables air pressure to be evenly distributed, ensuring a uniform and thin pattern over substrates. In addition, Obducat's "STUTM (Simultaneous Thermal and UVTM)" technology enables simultaneously combined UV and thermal NIL, allowing precise imprint to substrates. The patented "IPS (Intermediate Polymer Stamp)" imprint process enables contamination control and increases the stamp lifetime through a two-step
process where the contact between the master stamp and the hard substrate is avoided.

Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.
[key benefit]
● Soft Press TM technology : Full area uniform imprint
● STUTM (Simultaneous Thermal and UVTM) technology : Precise pattern transfer
● IPSTM (Intermediate Polymer StampTM) technology : Yield improvement

1. Soft Press Technology™ Full area uniform imprint Realizes uniform imprint by pressing stampers against substrates with air pressure. The use of Soft Press™ ensures parallelism between stamp and substrate, resulting in a thin and uniform residual layer at better than +/- 10 nm and is independent of substrate size shape and waviness.

2. STU™ - Simultaneous Thermal and UV™ Precise pattern transfer Obducat's proprietary STU™ technology enables simultaneously combined UV and thermal NIL, allowing imprint to UV-curable thermoplastic pre-polymers at a constant temperature. The method has been developed in order to overcome problems generating from the difference in thermal expansions between stamps and substrates. The method allows the use of spin-coated UV-curable polymers with a homogeneous thickness distribution on wafer scale, crucial for CD control and enabling pattern transfer to an
underlying substrate.

3. IPS™ - Intermediate Polymer Stamp™ Yield improvement This IPSTM technology was developed to solve the several concerns pointed out in the method which stampers directly touch substrates. The IPSTM technology enables contamination control, increases the stamp lifetime and avoids breakage, through a twostep process where the contact between the master stamp and the hard substrate is avoided. Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.

4. Auto transfer capabilities of substrate and stamper
Imprint under clean environment
Respective pod stages for both substrates and stamps enable to correspond to mini environment method. By using the private robot for auto transfer, risk of breakage during transportation and the contamination risk are alleviated. By equipping ULPA filter within the system, the transportation area of the substrates and stampers can be maintained at a class 10 level clean environment. Controlling contamination with the IPS™ technology and the pod function ensures improving yield.

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

Obducat develops and sells lithography solutions for production and replication of advanced micro- and nanostructures for industrial mass production and for research and development. Sales include equipment, stampers, process optimization, and licenses. Obducat also offers Scanning electron microscopes for metrology purposes.

For more information, please click here

Contacts:
Obducat AB
P.O. Box 580
201 25 Malmö
SWEDEN
Geijersgatan 2A, 216 18 Malmö
Phone: +46 40 362100
Fax: +46 40 362160
E-mail:

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

A 'movie' of ultrafast rotating molecules at a hundred billion per second: A quantum wave-like nature was successfully observed in rotating nitrogen molecules July 4th, 2015

New Biosensor Produced in Iran to Detect Effective Drugs in Cancer Treatment July 4th, 2015

Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015

Pioneering Southampton scientist awarded prestigious physics medal July 3rd, 2015

Tools

A 'movie' of ultrafast rotating molecules at a hundred billion per second: A quantum wave-like nature was successfully observed in rotating nitrogen molecules July 4th, 2015

Clues to inner atomic life from subtle light-emission shifts: Hyperfine structure of light absorption by short-lived cadmium atom isotopes reveals characteristics of the nucleus that matter for high precision detection methods July 3rd, 2015

Nanometrics to Announce Second Quarter Financial Results on July 23, 2015 July 2nd, 2015

NIST ‘How-To’ Website Documents Procedures for Nano-EHS Research and Testing July 1st, 2015

Alliances/Trade associations/Partnerships/Distributorships

Harris & Harris Group Portfolio Company, AgBiome, Announces Partnership to Accelerate the Discovery of Next Generation Insect-Resistant Crops July 1st, 2015

Graphene breakthrough as Bosch creates magnetic sensor 100 times more sensitive than silicon equivalent June 28th, 2015

Dyesol Joins Solliance as an Industrial Partner June 17th, 2015

The European project SVARNISH, a step forward in the food packaging sector June 11th, 2015

New-Contracts/Sales/Customers

Oxford Instruments’ TritonXL Cryofree dilution refrigerator selected for the Oxford NQIT Quantum Technology Hub project June 30th, 2015

Centre for Process Innovation pilots Beneq’s breakthrough roll-to-roll ALD system for moisture barrier films June 3rd, 2015

Argonne chooses Beneq’s TFS 500 Atomic Layer Deposition System: Modularity and flexibility make for a natural choice May 14th, 2015

New JEOL E-Beam Lithography System to Enhance Quantum NanoFab Capabilities May 6th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project