Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Abstract:
Canon Marketing Japan (President : Haruo Murase) is pleased to announce that it has signed an exclusive distribution agreement with Obducat (CEO : Patrik Lundstrom). The agreement gives CMJ the exclusive rights to sell Obducat's Nano Imprint Lithography equipment in Japan. Canon Marketing Japan will start marketing the equipment from March 1st, 2007 and enter into the new marketplace of nanoimprint equipment.

Canon Marketing Japan acquires exclusive sales right of Obducat’s Nano Imprint Lithography Equipment

Sweden and Japan | Posted on February 9th, 2007

NIL equipments, by pressing stampers to resist coated on substrates, enable transferring small feature pattern to optical components etc in the nanometer range and realize cost efficient pattern replication compared to existing photolithography equipments.

Nowadays, in line with the miniaturization and multifunctional capability of optical components such as polarizing elements, microlens arrays and LEDs or the density growth in storage devices such as magnetic or optical disks, needs for creating fine patterns to all kinds of substrates is growing. CMJ, having been marketing various equipments, including semiconductor-manufacturing equipments, LCD panel manufacturing equipments and measurement equipments, to the leading-edge industry, will further expand its business in the Industrial area with the new release of the nanoimprint equipment.

Obducat' NIL equipment, utilizes Obducat's proprietary "SoftPressTM " technology, which enables air pressure to be evenly distributed, ensuring a uniform and thin pattern over substrates. In addition, Obducat's "STUTM (Simultaneous Thermal and UVTM)" technology enables simultaneously combined UV and thermal NIL, allowing precise imprint to substrates. The patented "IPS (Intermediate Polymer Stamp)" imprint process enables contamination control and increases the stamp lifetime through a two-step
process where the contact between the master stamp and the hard substrate is avoided.

Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.
[key benefit]
● Soft Press TM technology : Full area uniform imprint
● STUTM (Simultaneous Thermal and UVTM) technology : Precise pattern transfer
● IPSTM (Intermediate Polymer StampTM) technology : Yield improvement

1. Soft Press Technology™ Full area uniform imprint Realizes uniform imprint by pressing stampers against substrates with air pressure. The use of Soft Press™ ensures parallelism between stamp and substrate, resulting in a thin and uniform residual layer at better than +/- 10 nm and is independent of substrate size shape and waviness.

2. STU™ - Simultaneous Thermal and UV™ Precise pattern transfer Obducat's proprietary STU™ technology enables simultaneously combined UV and thermal NIL, allowing imprint to UV-curable thermoplastic pre-polymers at a constant temperature. The method has been developed in order to overcome problems generating from the difference in thermal expansions between stamps and substrates. The method allows the use of spin-coated UV-curable polymers with a homogeneous thickness distribution on wafer scale, crucial for CD control and enabling pattern transfer to an
underlying substrate.

3. IPS™ - Intermediate Polymer Stamp™ Yield improvement This IPSTM technology was developed to solve the several concerns pointed out in the method which stampers directly touch substrates. The IPSTM technology enables contamination control, increases the stamp lifetime and avoids breakage, through a twostep process where the contact between the master stamp and the hard substrate is avoided. Instead a process with a soft intermediate stamp is used to transfer the pattern from the master to the substrate.

4. Auto transfer capabilities of substrate and stamper
Imprint under clean environment
Respective pod stages for both substrates and stamps enable to correspond to mini environment method. By using the private robot for auto transfer, risk of breakage during transportation and the contamination risk are alleviated. By equipping ULPA filter within the system, the transportation area of the substrates and stampers can be maintained at a class 10 level clean environment. Controlling contamination with the IPS™ technology and the pod function ensures improving yield.

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

Obducat develops and sells lithography solutions for production and replication of advanced micro- and nanostructures for industrial mass production and for research and development. Sales include equipment, stampers, process optimization, and licenses. Obducat also offers Scanning electron microscopes for metrology purposes.

For more information, please click here

Contacts:
Obducat AB
P.O. Box 580
201 25 Malmö
SWEDEN
Geijersgatan 2A, 216 18 Malmö
Phone: +46 40 362100
Fax: +46 40 362160
E-mail:

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Announcements

Tough foam from tiny sheets: Rice University lab uses atom-thick materials to make ultralight foam July 29th, 2014

Zenosense, Inc. July 29th, 2014

Optimum inertial design for self-propulsion: A new study investigates the effects of small but finite inertia on the propulsion of micro and nano-scale swimming machines July 29th, 2014

A new way to make microstructured surfaces: Method can produce strong, lightweight materials with specific surface properties July 29th, 2014

Tools

WITec to host the 11th Confocal Raman Imaging Symposium from September 29th - October 1st in Ulm, Germany July 28th, 2014

FEI adds Phase Plate Technology and Titan Halo TEM to its Structural Biology Product Portfolio: New solutions provide the high-quality imaging and contrast necessary to analyze the 3D structure of molecules and molecular complexes July 28th, 2014

Bruker Announces Acquisition of High-Speed, 3D Super-Resolution Fluorescence Microscopy Company Vutara July 28th, 2014

Malvern Instruments completes acquisition of MicroCal and announces purchase of Archimedes product from Affinity Biosensors July 25th, 2014

Alliances/Partnerships/Distributorships

SouthWest NanoTechnologies Names NanoSperse as A SWeNT Certified Compounder July 29th, 2014

ACS Biomaterials Science & Engineering™: Brand-new journal names editor July 29th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

Organometallics welcomes new editor-in-chief: Paul Chirik, Ph.D. July 22nd, 2014

New-Contracts/Sales/Customers

STFC takes delivery of the 100th Hitachi Tabletop SEM in the UK July 3rd, 2014

University of Maastricht Adds Complete Correlative Workflow from FEI to its Institute of Nanoscopy June 23rd, 2014

LatticeGear Sells First LatticeAx 300 Cleaving System to X-FAB: LatticeAx 300 provides fast, accurate cross-sectioning of samples for analysis — more accurately than manual methods and faster and less expensively than automated systems June 9th, 2014

UMass Amherst Purchases Nanonex Advanced 8" NIL Tool NX-2608BA May 28th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE