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FEI Company (Nasdaq: FEIC) will expand its top-of-the-line Helios NanoLab™ family of DualBeams™ when it introduces the Helios NanoLab 400 and 400S systems next week at SEMICON Japan. Combining advanced focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a highly-integrated and easy-to-use platform, the Helios NanoLab family of tools will provide semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs.
The Helios NanoLab family represents the next-generation of technology following the success of FEI's popular Strata™ 400 and 400 STEM (scanning/transmission electron microscope) in the semiconductor market. As with all FEI products for semiconductor manufacturers, the new Helios NanoLab systems are designed to help semiconductor companies move through design and process ramps quickly and with more efficiency, enabling them to introduce new products to market faster.
The Helios NanoLab family features a new ultra-high resolution field emission SEM column combined with FEI's widely acclaimed Sidewinder™ FIB column and gas chemistries to provide up to 40 percent improvement in imaging resolution compared to previous DualBeam systems. These systems feature greatly enhanced low-kV SEM resolution to support cross-sectional imaging and analysis and advanced STEM applications for devices featuring new materials and sub-65 nm design nodes. They also provide enhanced stability and optimized operation within a wide range of parameters.
The Helios NanoLab 400 offers an advanced high resolution stage and load lock and the 400S is equipped with a flip stage for highly precise sample localization to bridge the SEM-TEM gap. The 600 system, introduced earlier this year, offers a larger stage for versatile sample handling.
"From high volume 3D cross-sectional imaging and analysis to advanced high-resolution STEM imaging, the Helios NanoLab family offers solutions to meet the rigorous demands of semiconductor labs," said Tony Edwards, vice president and general manager of FEI's NanoElectronics business. "The Helios NanoLab systems represent FEI's continued lead in innovating combined FIB/SEM solutions. This new DualBeam will allow users to achieve ground-breaking results in multiple applications for advanced process nodes with accuracy and repeatability."
FEI delivers a complete range of market-leading FIB, FIB/SEM, S/TEM and TEM solutions designed to meet the challenges of today's semiconductor manufacturers. Together, the Helios NanoLab and the Titan S/TEM—the world's most powerful commercially-available microscope—represent a powerful and compelling tool set for a range of applications.
FEI (Nasdaq: FEIC) is a global leader in providing innovative instruments for nanoscale imaging, analysis and prototyping. FEI focuses on delivering solutions that provide groundbreaking results and accelerate research, development and manufacturing cycles for its customers in Semiconductor and Data Storage, Academic and Industrial R&D, and Life Sciences markets. With R&D centers in North America, Europe, and India, and sales and service operations in more than 50 countries around the world, FEI’s Tools for Nanotech™ are bringing the nanoscale within the grasp of leading researchers and manufacturers. More information can be found online at:
This news release contains forward-looking statements that include statements about our Helios NanoLab DualBeam product line and its capabilities. Factors that could affect these forward-looking statements include, but are not limited to, the ongoing performance of FEI's tools at customer sites and failure of the tools to achieve the anticipated performance. Please also refer to our Form 10-K, Forms 10-Q and other filings with the U.S. Securities and Exchange Commission for additional information on these factors and other factors that could cause actual results to differ materially from the forward-looking statements. FEI assumes no duty to update forward-looking statements.
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Dan Zenka, APR
Global Public Relations
+1 503 726 2695
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