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Home > News > Obducat receives essential NIL patent in USA

July 13th, 2006

Obducat receives essential NIL patent in USA

Abstract:
The US Patent Office has notified Obducat that they will issue a patent for the invention concerning Obducat’s unique Soft Press™ function, representing a vital part of the Obducat NIL technology (nano imprint lithography). The technology offers performance advantages in comparison with competing technologies. Pattern transfer using Soft Press™ enables even pressure across large surfaces, creating small and highly accurate structures in thin polymer layers with very high density.

Source:
Obducat

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