Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


Home > Press > SEMATECH Collaborates with University of Queensland

SEMATECH Collaborates with University of Queensland to Help Develop High Index Immersion Photoresists


Austin, TX | May 25, 2006

SEMATECH and the University of Queensland (Brisbane, Australia) will collaborate in a project that aims to develop new resists for 193 nm immersion lithography, an emerging technology for advanced semiconductor manufacturing.

Technologists from SEMATECH and the university will identify and qualify novel, high-refractive-index polymers for 193 nm photoresists in an effort to extend immersion lithography for multiple technology generations. This project is a key component of a broader SEMATECH program to extend immersion through novel high refractive index materials in three categories: resist, immersion fluids and lens materials.

Immersion lithography combines the familiar 193 nm light wavelength with a refracting fluid such as water to define patterns as narrow as 45 nm in advanced microchips. Increasing the refractive index of photoresists, along with the immersion fluid and lens material, offers the possibility of extending immersion lithography to patterns as narrow as 32 nm.

Also, increasing just the refractive index of photoresists offers the possibility to improve the process latitude of patterned features on a semiconductor wafer, thereby extending the capability of a given lithography toolset.

A two-year grant for $510,000 Australian dollars from the Australian Research Council (ARC) will be matched by SEMATECH with cash and in-kind contributions, including access to advanced immersion lithography exposure tools through SEMATECH's Immersion Technology Center, as well as project management and logistical resources. The ARC is a government agency that funds research that can bring economic, social and cultural benefits to the country.

"One of our basic objectives at SEMATECH is to maximize the world's R&D resources through leverage and creative partnerships," said Michael R. Polcari, SEMATECH president and CEO. "This agreement with ARC certainly exemplifies that aim, and allows us to share expertise with a region that is seeking to become a world leader in microelectronics."

SEMATECH's role in the project was defined by Will Conley, a Freescale assignee. "The research of high-index polymers will provide the industry with an additional avenue for the extension of optical lithography," Conley said. "The partnership between SEMATECH and the University of Queensland already has yielded many interesting material platforms, and this grant from the ARC will permit the further research needed."

Professor Andrew Whittaker, director for the Centre for Magnetic Resonance of the University of Queensland, said: "The support of SEMATECH on this project enables the university to assemble a world-class team dedicated to synthesis of novel resist polymers. From our perspective, the agreement with the ARC and SEMATECH allows us to contribute to an exciting technology of great international importance.

"From the point of view of the Australian economy, the funding provides employment for talented young scientists, and provides a platform for continued research within Australia in the field of photolithography."

The Australian grant for the project was described as one of the largest awarded by the ARC in recent rounds of funding. "The materials to be developed are expected to provide the basis of future generations of microchips," according to a project summary that accompanied the grant. "A major outcome of this project will be establishment of Australia as a world leader in this rapidly expanding field."


SEMATECH is the world's catalyst for accelerating the commercialization of technology innovations into manufacturing solutions. By setting global direction, creating opportunities for flexible collaboration, and conducting strategic R&D, SEMATECH delivers significant leverage to our semiconductor and emerging technology partners. In short, we are accelerating the next technology revolution.

SEMATECH, the SEMATECH logo, AMRC, Advanced Materials Research Center, ATDF, the ATDF logo, Advanced Technology Development Facility, ISMI and International SEMATECH Manufacturing Initiative are servicemarks of SEMATECH, Inc.

For more information, please visit

Media Contact:
Dan McGowan

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

'Material universe' yields surprising new particle November 28th, 2015

New 'self-healing' gel makes electronics more flexible November 25th, 2015

Physicists explain the unusual behavior of strongly disordered superconductors: Using a theory they developed previously, the scientists have linked superconducting carrier density with the quantum properties of a substance November 25th, 2015

Nanomagnets: Creating order out of chaos: Dresden physicists engrave nanoscale magnets directly into layer of material November 23rd, 2015


New Model Presented to Design, Produce Electronic Nanodevices November 6th, 2015

GLOBALFOUNDRIES Achieves 14nm FinFET Technology Success for Next-Generation AMD Products: Leading-edge foundry’s proven silicon technology poised to help enable significant performance and power efficiency improvements for AMD’s next-generation products November 6th, 2015

USF team finds new way of computing with interaction-dependent state change of nanomagnets: University of South Florida engineering researchers find nano-scale magnets could compute complex functions significantly faster than conventional computers October 29th, 2015

Nanoquakes probe new 2-dimensional material: Collaborative research between UC Riverside and the University of Augsburg, Germany, opens up new ways of understanding monolayer films for (opto-)electronic applications October 26th, 2015


'Material universe' yields surprising new particle November 28th, 2015

Iranian Scientists Discover New Catalyst to Remove Pharmaceutical Compounds from Wastewater November 28th, 2015

RAMAN Spectrometry Makes Characterization of Various Nanostructures Possible November 28th, 2015

Nanoparticles Boost Impact Resistance of Special Type of Polymer November 28th, 2015

The latest news from around the world, FREE

  Premium Products
Only the news you want to read!
 Learn More
University Technology Transfer & Patents
 Learn More
Full-service, expert consulting
 Learn More

Nanotechnology Now Featured Books


The Hunger Project

Car Brands
Buy website traffic