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Home > Press > 50th EIPBN Meeting

Lord Alec Broers will deliver a keynote

50th EIPBN Meeting to Feature Top Speakers in Submicron Lithography


Austin, TX | April 21, 2006

A roster of distinguished speakers and a focus on the science and technology of nanolithography and its applications will highlight the 50th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) May 30-June 2 at the Baltimore Marriott Waterfront Hotel in Baltimore, MD.

This four-day event features sessions that focus on patterning of materials at dimensions approaching the atomic level, and applications thereof. (The name EIPBN originated from the use of photon, electron and ion beam technologies in patterning, but has since grown to include nanoimprint transfer, novel resists, and etch processes as well as applications.) The conference is co-sponsored by the American Vacuum Society in cooperation with the IEEE Electron Devices Society and the Optical Society of America.

To mark the 50th year of the conference, litho patterning pioneer Lord Alec Broers of The Royal Society of Engineering will deliver a keynote address, "The Evolution of Technology." Other featured speakers will include Stefan Hell, Max Planck Institute, on "Microscopy Below the Diffraction Limit"; George Bourianoff, Intel and the SRC, on "Computing Devices After Moore's Law"; Tom Jackson, Pennsylvania State University, on "Electronics Anywhere"; and Erik Winfree, Caltech, on "Algorithmic Self-Assembly of DNA."

Special sessions will address advanced optical lithography, extreme ultraviolet (EUV), ion beam lithography, inspection and analysis, modeling, simulation and CAD, nanobiology, directed assembly, maskless lithography, resist materials and processes, applications of electron beam lithography, molecular scale electronics, nanomedicine, integration, nanoimprint lithography, and synchrotron lithography. A one-day commercial exhibition will include system suppliers for lithography, metrology, inspection, processing, nanofabrication, and characterization as well as suppliers of simulation tools, data management, materials, services, and subsystems.

Conference Chairman Shane Palmer, a Texas Instruments assignee to SEMATECH, said: "Our Program Chairman, Dr. Shalom Wind, has put together a very exciting technical program covering topics of critical importance to the industry and research." Special events to commemorate the meeting's 50th anniversary also are planned.

Registration and additional program information are available at


SEMATECH is the world's catalyst for accelerating the commercialization of technology innovations into manufacturing solutions. By setting global direction, creating opportunities for flexible collaboration, and conducting strategic R&D, SEMATECH delivers significant leverage to our semiconductor and emerging technology partners. In short, we are accelerating the next technology revolution.

SEMATECH, the SEMATECH logo, AMRC, Advanced Materials Research Center, ATDF, the ATDF logo, Advanced Technology Development Facility, ISMI and International SEMATECH Manufacturing Initiative are servicemarks of SEMATECH, Inc.

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Dan McGowan

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