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Home > Press > Nanoscience Experts to Highlight ICMI Meeting in Austin

Nanoscience Experts to Highlight ICMI Meeting in Austin; Sponsors are AVS, SEMATECH & AMRC

Austin, TX | Posted on February 13, 2006

Leading technologists in transistor and interconnect research, and the metrology that supports it, will highlight the 7th International Conference on Microelectronics and Interfaces (ICMI), scheduled March 6 - ­8 at the Omni Austin Hotel, ­Downtown.

The event, expected to attract approximately 100 scientists and engineers from around the globe, will feature keynote talks by Dr. Thomas Theis, Director of Physical Sciences for IBM Research, on "Nanoscience and the Future of Information Technology," and Dr. David Seiler, National Institute of Science and Technology, on "Extending CMOS Measurements to the Nanoscale."

A third keynote will be delivered by Jamie McLeroy, SEMATECH senior counsel, on "Trends in State-Sponsored Research and Development." This talk will highlight initiatives such as Texas' Advanced Materials Research Center (AMRC), a conference sponsor.

ICMI'06 is co-sponsored by AVS, SEMATECH, and the AMRC, a collaboration between SEMATECH and Texas universities. Like the six annual conferences that preceded it, ICMI'06 will provide a venue for industry, government, and academic scientists and engineers to exchange ideas on nanodevice fabrication. Key sessions and invited speakers will include:

  • Designs and Materials for Alternative Charge or Magnetic Moment-Based Devices. Speakers will include Ananth Dodabalapur of The University of Texas at Austin on "Functional Integration of Silicon and Organic Semiconductors In Novel Sensor Devices," and Sanjay Banerjee, UT Austin, with "An Overview of Alternative Charge and Magnetic Moment Based Devices."
  • Stress Engineering in Transistor Channels and Thin Films, with talks by Ted White, Freescale Semiconductor, on "Strained Si Transistors," and Bruce Doris, IBM, on "Mobility Enhancement for Advanced CMOS Devices."
  • Gate Stack and Junction Engineering, featuring talks from SEMATECH's Byoung Hun Lee, on "High-k/Metal Gate Technology" and Lourdes Pelaz, University of Valladolid, on "Atomistic Modeling of Dopant Implantation, Diffusion, and Activation."
  • Contact and Interconnect Stack Engineering. Christophe Detavernier, Univ. Gent, Belgium, will address "Nickel Silicide," and James J.-Q. Lu, Rensselaer Polytechnic Institute, will speak on "Trends and Challenges in Wafer-Level Three-Dimensional (3D) Integration."
  • Formation, Patterning and Characterization of Films & Interfaces. Addressing the session will be IBM's Charles Black, on "Applications of Self-Assembled Polymers for Microelectronics," and UT's C. Grant Willson on "Advanced Imaging Technology for Semiconductor Manufacturing: A View of the Future."

Additionally, six AVS short courses will be offered in Vacuum and Equipment Technology; Materials and Interface Characterization; and Materials Processing. More information on ICMI is available at


About AVS:
AVS is a volunteer-based, non-profit organization dedicated to advancing science and technology related to thin films, microelectronics, nanostructures, processing, surfaces, and vacuum and to providing a variety of relevant educational opportunities to meet the growing needs of industry.

SEMATECH is the world's catalyst for accelerating the commercialization of technology innovations into manufacturing solutions. By setting global direction, creating opportunities for flexible collaboration, and conducting strategic R&D, SEMATECH delivers significant leverage to our semiconductor and emerging technology partners. In short, we are accelerating the next technology revolution.

SEMATECH, the SEMATECH logo, AMRC, Advanced Materials Research Center, ATDF, the ATDF logo, Advanced Technology Development Facility, ISMI and International SEMATECH Manufacturing Initiative are servicemarks of SEMATECH, Inc.

For more information, please click here.

AVS Contact:
Della Miller

Dan McGowan

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

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