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Home > News > Obducat tips 300-mm nano-imprint litho

October 12th, 2005

Obducat tips 300-mm nano-imprint litho

Abstract:
The Swedish company appears to be aiming its future tools for chip-production at the 32-nm node and beyond. Nano-imprint is among the lithography candidates for IC production at 32-nm and beyond. Other possible hopefuls include extreme ultraviolet (EUV), immersion lithography and maskless.

Source:
EETimes

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