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Home > News > OPC for hyper-NA works at 45-nm, says Synopsys

October 4th, 2005

OPC for hyper-NA works at 45-nm, says Synopsys

Abstract:
EDA software vendor Synopsys, Inc. said it is involved in a joint program with the Sematech research consortium to develop optical proximity correction (OPC) models to allow optical lithography to be used with manufacturing processes at 45-nanometer and beyond.

Source:
EETimes

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