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Home > News > Nano-Imprint Makes its Mark

July 6th, 2005

Nano-Imprint Makes its Mark

Although most of the semiconductor industry is still learning to build chips with circuits as narrow as 90 nanometers, Hewlett-Packard researcher Stan Williams is using a novel process called nano-imprint lithography (NIL) to make experimental memory chips with tiny electrical pathways less than half that size. "We're now using imprint lithography to routinely make real, operating circuits with a half-pitch [width] of 30 nanometers," says Williams, a senior fellow and director of quantum science research at HP Labs.


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