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Home > News > Sematech Brings EUV Litho Closer

December 20th, 2004

Sematech Brings EUV Litho Closer

Abstract:
Researchers at SEMATECH North have reached a significant milestone in reducing deposition tool-generated defects in mask blanks used for extreme ultraviolet lithography (EUVL), bringing that technology a step closer to commercial feasibility.

Source:
reed-electronics

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