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Home > News > Tegal Awarded Key Patent for New Magnetron Sputter Source

December 14th, 2004

Tegal Awarded Key Patent for New Magnetron Sputter Source

Abstract:
Tegal Corporation today announced that it has been granted United States Patent, No. 6,783,638 for the Flat Magnetron sputter source. The invention provides for the use of a greater percentage of the material from the sputter target than in existing conventional physical vapor deposition ("PVD") systems.

Source:
businesswire

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