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Home > News > Tegal Awarded Key Patent for New Magnetron Sputter Source

December 14th, 2004

Tegal Awarded Key Patent for New Magnetron Sputter Source

Tegal Corporation today announced that it has been granted United States Patent, No. 6,783,638 for the Flat Magnetron sputter source. The invention provides for the use of a greater percentage of the material from the sputter target than in existing conventional physical vapor deposition ("PVD") systems.


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