Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > News > New look for nanofabrication

December 6th, 2004

New look for nanofabrication

Abstract:
Physicists in Germany have developed a new approach to atom lithography that can beat the classical diffraction limit by a factor of two. The technique, developed by Markus Oberthaler and colleagues at the universities of Heidelberg and Konstanz, exploits quantum aspects of the interaction between light and matter.

Source:
nanotechweb

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Discoveries

Sunblock poses potential hazard to sea life August 20th, 2014

Rice physicist emerges as leader in quantum materials research: Nevidomskyy wins both NSF CAREER Award and Cottrell Scholar Award August 20th, 2014

Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Ultrasonic Waves Applied in Production of Graphene Nanosheets August 20th, 2014

Announcements

Rice physicist emerges as leader in quantum materials research: Nevidomskyy wins both NSF CAREER Award and Cottrell Scholar Award August 20th, 2014

Graphene may be key to leap in supercapacitor performance August 20th, 2014

Newly-Developed Nanobiosensor Quickly Diagnoses Cancer August 20th, 2014

Ultrasonic Waves Applied in Production of Graphene Nanosheets August 20th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE