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Home > News > New look for nanofabrication

December 6th, 2004

New look for nanofabrication

Abstract:
Physicists in Germany have developed a new approach to atom lithography that can beat the classical diffraction limit by a factor of two. The technique, developed by Markus Oberthaler and colleagues at the universities of Heidelberg and Konstanz, exploits quantum aspects of the interaction between light and matter.

Source:
nanotechweb

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