Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > FEI Releases DualBeam Photomask Repair System for 65 nm Node

September 13th, 2004

FEI Releases DualBeam Photomask Repair System for 65 nm Node

Abstract:
FEI Company has released the industry's first-ever DualBeam(TM) mask repair system designed to repair photolithography mask defects for the 65 nm node. Combining both a focused ion beam (FIB) column and an environmental scanning electron microscope (ESEM(TM)) in a single system, the new Accura(TM) XT+ is a future-safe solution that can accommodate both today's photomasks and extend to a broad set of next-generation lithography technologies.

Source:
PRNewswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Picosun patents ALD nanolaminate to prevent electronics from overheating September 28th, 2016

Researchers at the Catalan Institute of Nanoscience and Nanotechnology show that bending semiconductors generates electricity September 26th, 2016

Mexican scientist in the Netherlands seeks to achieve data transmission ... speed of light September 20th, 2016

Towards Stable Propagation of Light in Nano-Photonic Fibers September 20th, 2016

Announcements

Nanosensors could help determine tumors’ ability to remodel tissue: Measuring enzyme levels could help doctors select appropriate treatments September 29th, 2016

Innovation in Nanotechnology is Focus of Symposium: Annual event brings international experts to Northwestern Oct. 6 September 29th, 2016

Cambrios at CEATEC - Japan 2016 September 29th, 2016

Picosun patents ALD nanolaminate to prevent electronics from overheating September 28th, 2016

Tools

Oxford Instruments systems now facilitate water purification technology September 27th, 2016

Dr Barbara Armbruster promoted to Worldwide Sales and Marketing Director for XEI Scientific September 27th, 2016

Oxford Instruments is ‘Bringing the Nanoworld Together’ in India once again - 22 - 23 November 2016 | IISc Bangalore September 21st, 2016

Bruker Introduces Complete Commercial AFM-Based SECM Solution: PeakForce SECM Mode Enables Previously Unobtainable Electrochemical Information September 20th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic