- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
September 11th, 2004
A group led by Bell Labs and AMSL Holding NV claims to have made a major breakthrough in maskless lithography that could eventually bring the technology into production fabs.
Lucent Technologies Inc.'s Bell Labs unit, along with ASML and others, have been selected by the Defense Advanced Research Projects Agency (DARPA) to develop a maskless optical lithography tool for aerospace, military and related applications.
|Related News Press|
New research unveils graphene 'moth eyes' to power future smart technologies: New ultra-thin, patterned graphene sheets will be essential in designing future technologies such as 'smart wallpaper' and Internet-of-things applications March 1st, 2016
Cooling graphene-based film close to pilot-scale production April 30th, 2016
Exploring phosphorene, a promising new material April 29th, 2016
Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016
The light stuff: A brand-new way to produce electron spin currents - Colorado State University physicists are the first to demonstrate using non-polarized light to produce a spin voltage in a metal April 26th, 2016
NRL reveals novel uniform coating process of p-ALD April 21st, 2016