- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
September 11th, 2004
A group led by Bell Labs and AMSL Holding NV claims to have made a major breakthrough in maskless lithography that could eventually bring the technology into production fabs.
Lucent Technologies Inc.'s Bell Labs unit, along with ASML and others, have been selected by the Defense Advanced Research Projects Agency (DARPA) to develop a maskless optical lithography tool for aerospace, military and related applications.
|Related News Press|
New research unveils graphene 'moth eyes' to power future smart technologies: New ultra-thin, patterned graphene sheets will be essential in designing future technologies such as 'smart wallpaper' and Internet-of-things applications March 1st, 2016
Soft decoupling of organic molecules on metal June 23rd, 2016
Scientists engineer tunable DNA for electronics applications June 21st, 2016
Marrying superconductors, lasers, and Bose-Einstein condensates: Chapman University Institute for Quantum Studies (IQS) member Yutaka Shikano, Ph.D., recently had research published in Scientific Reports June 20th, 2016