- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
September 11th, 2004
A group led by Bell Labs and AMSL Holding NV claims to have made a major breakthrough in maskless lithography that could eventually bring the technology into production fabs.
Lucent Technologies Inc.'s Bell Labs unit, along with ASML and others, have been selected by the Defense Advanced Research Projects Agency (DARPA) to develop a maskless optical lithography tool for aerospace, military and related applications.
|Related News Press|
New research unveils graphene 'moth eyes' to power future smart technologies: New ultra-thin, patterned graphene sheets will be essential in designing future technologies such as 'smart wallpaper' and Internet-of-things applications March 1st, 2016
Gigantic ultrafast spin currents: Scientists from TU Wien (Vienna) are proposing a new method for creating extremely strong spin currents. They are essential for spintronics, a technology that could replace today's electronics May 25th, 2016
Dartmouth team creates new method to control quantum systems May 24th, 2016
Attosecond physics: A switch for light-wave electronics May 24th, 2016
Doubling down on Schrödinger's cat May 27th, 2016
Nanoscale Trojan horses treat inflammation May 24th, 2016
Programmable materials find strength in molecular repetition May 23rd, 2016