Home > News > Researchers Develop Improved Method to Produce Nanometer-scale Patterns
August 30th, 2004
Researchers Develop Improved Method to Produce Nanometer-scale Patterns
Abstract:
Researchers from the Georgia Institute of Technology and the Naval Research Laboratory (NRL) have developed an improved method for directly writing nanometer-scale patterns onto a variety of surfaces.
Infrared microscope image shows a cantilever during heating. The colors correspond to temperature, the hottest reaching approximately 200 degrees Celsius. The microcantilevers are engineered such that the temperature increases only near the free end. The new writing method, dubbed “thermal dip pen nanolithography,” represents an important extension for dip pen nanolithography (DPN), an increasingly popular technique that uses atomic force microscopy (AFM) probes as pens to produce nanometer-scale patterns.
Source:
GTResearchnews
Bookmark:
| Related News Press |
Chip Technology
Discovery points path to flash-like memory for storing qubits: Rice find could hasten development of nonvolatile quantum memory April 5th, 2024
Utilizing palladium for addressing contact issues of buried oxide thin film transistors April 5th, 2024
HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024
Discoveries
Chemical reactions can scramble quantum information as well as black holes April 5th, 2024
New micromaterial releases nanoparticles that selectively destroy cancer cells April 5th, 2024
Utilizing palladium for addressing contact issues of buried oxide thin film transistors April 5th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||