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Home > News > IBM adds immersion lithography to IC roadmap

August 27th, 2004

IBM adds immersion lithography to IC roadmap

Abstract:
Preparing for the next wave of devices, IBM Corp. has quietly added immersion lithography to its chip-manufacturing roadmap. Back in 2003 IBM planned to extend 193-nm tools to the 65-nm node, thereby pushing out 157-nm scanners to the 45-nm node. For the 32-nm node, IBM has been evaluating several next-generation lithography technologies (NGL), such as electron-beam projection (EPL), extreme ultraviolet (EUV), and others

Source:
EETimes

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