Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > News > IBM adds immersion lithography to IC roadmap

August 27th, 2004

IBM adds immersion lithography to IC roadmap

Abstract:
Preparing for the next wave of devices, IBM Corp. has quietly added immersion lithography to its chip-manufacturing roadmap. Back in 2003 IBM planned to extend 193-nm tools to the 65-nm node, thereby pushing out 157-nm scanners to the 45-nm node. For the 32-nm node, IBM has been evaluating several next-generation lithography technologies (NGL), such as electron-beam projection (EPL), extreme ultraviolet (EUV), and others

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE