Nanotechnology Now





Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Ion beams light way for 4wave fab process

August 16th, 2004

Ion beams light way for 4wave fab process

Abstract:
4Wave Inc. wants to prove that its small technology is no optical illusion. Applying a precision technique known as ion sputtering, Sterling, Va.-based 4Wave produces atomically thin films used for making next-generation optical chips. The 4Wave chips integrate four distinct optical filters and a reflective mirror on a flat glass surface.

Source:
SmallTimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Basel physicists develop efficient method of signal transmission from nanocomponents May 23rd, 2015

Nanometrics Announces Live Webcast of Upcoming Investor and Analyst Day May 20th, 2015

Sandia researchers first to measure thermoelectric behavior by 'Tinkertoy' materials May 20th, 2015

Defects can 'Hulk-up' materials: Berkeley lab study shows properly managed damage can boost material thermoelectric performances May 20th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project