Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Ion beams light way for 4wave fab process

August 16th, 2004

Ion beams light way for 4wave fab process

Abstract:
4Wave Inc. wants to prove that its small technology is no optical illusion. Applying a precision technique known as ion sputtering, Sterling, Va.-based 4Wave produces atomically thin films used for making next-generation optical chips. The 4Wave chips integrate four distinct optical filters and a reflective mirror on a flat glass surface.

Source:
SmallTimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Pulverizing e-waste is green, clean -- and cold: Rice, Indian Institute researchers use cryo-mill to turn circuit boards into separated powders March 21st, 2017

Electro-optical switch transmits data at record-low temperatures: Operating at temperatures near absolute zero, switch could enable significantly faster data processing with lower power consumption March 20th, 2017

UC researchers use gold coating to control luminescence of nanowires: University of Cincinnati physicists manipulate nanowire semiconductors in pursuit of making electronics smaller, faster and cheaper March 17th, 2017

AIM Photonics Welcomes Coventor as Newest Member: US-Backed Initiative Taps Process Modeling Specialist to Enable Manufacturing of High-Yield, High-Performance Integrated Photonic Designs March 16th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project