Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Ion beams light way for 4wave fab process

August 16th, 2004

Ion beams light way for 4wave fab process

Abstract:
4Wave Inc. wants to prove that its small technology is no optical illusion. Applying a precision technique known as ion sputtering, Sterling, Va.-based 4Wave produces atomically thin films used for making next-generation optical chips. The 4Wave chips integrate four distinct optical filters and a reflective mirror on a flat glass surface.

Source:
SmallTimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Spintronics for future information technologies: Spin currents in topological insulators controlled May 2nd, 2016

Cooling graphene-based film close to pilot-scale production April 30th, 2016

Exploring phosphorene, a promising new material April 29th, 2016

Researchers create a first frequency comb of time-bin entangled qubits: Discovery is a significant step toward multi-channel quantum communication and higher capacity quantum computers April 28th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic