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Home > News > European alliance grows for 45-nm gate stack push

August 16th, 2004

European alliance grows for 45-nm gate stack push

Abstract:
Collaborative research is cranking up in Europe, as France's CEA Laboratory of Electronics and Information Technologies (LETI) has gathered partners in a project to develop a 45-nanometer-and-beyond CMOS gate stack with a high-k insulator and metal gate electrodes.

Source:
EEDesign

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