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Home > News > Optical Lithography Refinement Essential

August 16th, 2004

Optical Lithography Refinement Essential

Optical lithography may currently offer the advantage of high wafer throughputs, but to sustain in the long term and compete with the next generation lithography (NGL) technologies, it must deliver finer resolution and achieve the desired quality, reliability, and cost targets. "Constant improvements in optical lithography are likely to play a crucial role in assisting the semiconductor industry to achieve shrinking device sizes and increased chip performance," says Technical Insights Research Analyst Sivakumar Muthuramalingam.


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