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June 15th, 2004 Ultratech Introduces the LSA100 Laser Spike Anneal System Abstract: Ultratech, Inc. today introduced the LSA100 laser spike anneal system -- the first tool built on the company's new Unity Platform(TM), announced earlier today. Featuring the patented laser-processing (LP) technology Ultratech unveiled last year, the LSA100 represents one of the industry's first commercially available laser-processing systems for both development and volume production of 65nm and smaller devices. Source: PRNewswire Bookmark: Related News Press Announcements Nanomaterials - Worldwide Market Challenges & Opportunities February 8th, 2010 Growing Cartilage -- No Easy Task February 8th, 2010 McCormick School Student Awarded Churchill Scholarship February 8th, 2010 Insulation From Space? February 8th, 2010 Tools Ultratech Receives Follow-On, Multi-System Order for Laser Spike Annealing Systems From Major Logic February 8th, 2010 Smaller, less expensive deposition systems are enabling biomedical and life science labs to undertake parylene experimentation February 8th, 2010 McCormick School Student Awarded Churchill Scholarship February 8th, 2010 Electrons on the brink: Fractal patterns may be key to semiconductor magnetism February 7th, 2010