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Home > News > Lithography makes a connection for nanowire devices

June 9th, 2004

Lithography makes a connection for nanowire devices

Abstract:
Researchers at Harvard University, US, have used a photolithography technique to set up interconnects to nanowire devices. The method uses a statistical approach to ensure that a high proportion of the nanowires connects to the electrodes - there is no need to link the two components individually. We believe this is the first reported bottom-up assembly and device integration approach that is fully scalable in terms of device density and area of coverage, Song Jin and Dongmok Whang told nanotechweb.org. It provides a pathway for the development of highly functional and integrated nanosystems.

Source:
Nanotechweb

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