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Home > News > Nano-litho start-up aims at the 45-nm node

April 23rd, 2004

Nano-litho start-up aims at the 45-nm node

Abstract:
Molecular Imprints Inc. (MII), a developer of a maskless alternative to optical lithography known as nano-imprint lithography, expects to ship 12 machines in 2004. These will be low-throughput machines, only able to handle a few wafers an hour, but suitable for emerging applications in MEMS, optical components, microfluidics and bio-chips, as well as for R&D and process development for conventional chipmaking.

Source:
* Silicon Strategies

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