Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Tegal Corporation Announces High-K Nano Layer Deposition Project

April 13th, 2004

Tegal Corporation Announces High-K Nano Layer Deposition Project

Abstract:
Tegal Corporation and Sharp Laboratories of America have entered into an agreement to collaborate on a focused joint development program (JDP) to accelerate the adoption and integration of next generation high-K dielectrics. The JDP builds on Tegal's patented Nano Layer Deposition (NLD) technology for depositing ultra thin layers of new dielectric materials for semiconductor and nanotechnology device production.

Source:
Businesswire

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Investments/IPO's/Splits

Harris & Harris Group Portfolio Company, Magic Leap, Raises $793.5 Million in New Funding February 3rd, 2016

Israel: A Nanotech Superpower: Did you know that Israel is a hotbed for nanotechnology research and development? February 1st, 2016

PEN Inc. Announces 1-for-180 Reverse Stock Split January 27th, 2016

Nanometrics to Announce Fourth Quarter and Full Year Financial Results on February 2, 2016 January 13th, 2016

Tools

Metal oxide sandwiches: New option to manipulate properties of interfaces February 8th, 2016

Researchers discover new phase of boron nitride and a new way to create pure c-BN February 5th, 2016

Cornell researchers create first self-assembled superconductor February 1st, 2016

New record in nanoelectronics at ultralow temperatures January 28th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic