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Home > News > JMAR Improves CPL Reliability and Productivity for X-Ray Litho

April 5th, 2004

JMAR Improves CPL Reliability and Productivity for X-Ray Litho

Abstract:
JMAR Technologies, Inc. reported that the recent endurance trial of its Collimated Plasma Lithography (CPL(TM)) X-ray light source and wafer exposure system achieved significantly improved reliability and productivity while printing sub-90 nanometer features. As a result of the Company's progress, Defense Advanced Research Projects Agency released a new $1.6 million block of funding, $800,000 of which was announced by the Company last week.

Source:
Businesswire

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