Home > News > NTT Announces Creation of Three-Dimensional Nanofabrication
February 4th, 2004
NTT Announces Creation of Three-Dimensional Nanofabrication
Abstract:
Nippon Telegraph and Telephone Corporation has created an electron beam (EB) lithography system that enables the fabrication of extremely small three-dimensional structures with sizes measured in nanometers. NTT demonstrated the 3D nanopatterning and nanofabrication by exposing a small sphere to the EB to form the world's smallest globe. (more on earleir article)
Source:
JCN
Bookmark:
Chip Technology
Researchers Stitch Defects into the World’s Thinnest Semiconductor May 22nd, 2013
Whirlpools on the Nanoscale Could Multiply Magnetic Memory: At the Advanced Light Source, Berkeley Lab scientists join an international team to control spin orientation in magnetic nanodisks May 22nd, 2013
Imec and GLOBALFOUNDRIES collaborate to advance high-density memory technology: STT-MRAM offers enhanced performance and scalability for embedded and standalone applications May 21st, 2013
Penn engineers' nanoantennas improve infrared sensing May 20th, 2013
Discoveries
Nano-needles for cells May 25th, 2013
How do cold ions slide May 24th, 2013
Gold nanocrystal vibration captured on billion-frames-per-second film May 23rd, 2013
Atomic-Scale Investigations Solve Key Puzzle of LED Efficiency: MIT and Brookhaven Lab scientists use electron microscopy imaging techniques to settle a solid-state controversy and raise new experimental possibilities May 22nd, 2013