Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Nano-imprint lithography added to ITRS roadmap

December 2nd, 2003

Nano-imprint lithography added to ITRS roadmap

Abstract:
While immersion lithography is grabbing the headlines these days, there is another promising technology emerging on the horizon - nano-imprint lithography. Molecular Imprints Inc. (MII), one of the leading developers of this technology, Tuesday (Dec. 2) said that nano-imprint technology has been placed on the 2003 edition of the International Roadmap for Semiconductors (ITRS). Nano-imprint lithography is currently slated for the 32-nm node on the ITRS roadmap. The 32-nm node is expected to emerge in the 2009 time frame.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Nanometrics to Announce Third Quarter Financial Results on October 30, 2018 October 10th, 2018

Graphene controls surface magnetism at room temperature October 8th, 2018

UCI scientists push microscopy to sub-molecular resolution: Carbon monoxide used to measure electric forces in single chemical compound October 2nd, 2018

Machine learning helps improving photonic applications September 28th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project