Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Nano-imprint lithography added to ITRS roadmap

December 2nd, 2003

Nano-imprint lithography added to ITRS roadmap

Abstract:
While immersion lithography is grabbing the headlines these days, there is another promising technology emerging on the horizon - nano-imprint lithography. Molecular Imprints Inc. (MII), one of the leading developers of this technology, Tuesday (Dec. 2) said that nano-imprint technology has been placed on the 2003 edition of the International Roadmap for Semiconductors (ITRS). Nano-imprint lithography is currently slated for the 32-nm node on the ITRS roadmap. The 32-nm node is expected to emerge in the 2009 time frame.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Geoffrey Beach: Drawn to explore magnetism: Materials researcher is working on the magnetic memory of the future April 25th, 2017

'Neuron-reading' nanowires could accelerate development of drugs for neurological diseases April 12th, 2017

Nanometrics to Announce First Quarter Financial Results on May 2, 2017 April 11th, 2017

AIM Photonics Presents Cutting-Edge Integrated Photonics Technology Developments to Packed House at OFC 2017, the Optical Networking and Communication Conference & Exhibition April 11th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project