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Home > News > Nano-imprint lithography added to ITRS roadmap

December 2nd, 2003

Nano-imprint lithography added to ITRS roadmap

Abstract:
While immersion lithography is grabbing the headlines these days, there is another promising technology emerging on the horizon - nano-imprint lithography. Molecular Imprints Inc. (MII), one of the leading developers of this technology, Tuesday (Dec. 2) said that nano-imprint technology has been placed on the 2003 edition of the International Roadmap for Semiconductors (ITRS). Nano-imprint lithography is currently slated for the 32-nm node on the ITRS roadmap. The 32-nm node is expected to emerge in the 2009 time frame.

Source:
EETimes

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