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Home > News > NanoINK Announces Grant

November 10th, 2003

NanoINK Announces Grant

Abstract:
NanoINK, Inc. today announced the grant of United States Patent No. 6,635,311. The patent, which issued on October 21, is the first domestic patent related to Dip Pen Nanolithography(TM) technology, and the second worldwide. DPN is a revolutionary process for building nanoscale structures by directly printing them onto surfaces. The extraordinary resolution of the process and its almost unlimited material flexibility represent a unique and powerful nanofabrication process. The patent rights to this and many other DPN inventions are owned by Northwestern and licensed exclusively to NanoINK.

Source:
NanoINK

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