Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > Focal Point's 3-d lithography could lower barrier to MEMS use

September 2nd, 2003

Focal Point's 3-d lithography could lower barrier to MEMS use

Abstract:
Focal Point Microsystems LLC of Tuscon, Ariz., believes its technology ends the quest for cost-effective nanoscale lithography for MEMS devices – an elusive industry Holy Grail. Focal Point is one of a number of companies – including a joint venture by Micronic Laser Systems AB of Sweden and ASML Holding NV of the Netherlands – pursuing maskless lithography for production of microscopic devices.

Source:
SmallTimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

MEMS

HTA to Present European Strategy for Competitive Micro- and Nanotechnologies & Smart Systems: Special Event in Brussels on April 24 Gathers Research Institutes’ CEOs, European Commissioners and Key European Industrials April 17th, 2018

New approach to measuring stickiness could aid micro-device design March 8th, 2018

MEMS chips get metatlenses: Combining metasurface lenses with MEMS technology could add high-speed scanning and enhance focusing capability of optical systems February 21st, 2018

First Capacitive Transducer with 13nm Gap July 27th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project