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Home > News > Focal Point's 3-d lithography could lower barrier to MEMS use

September 2nd, 2003

Focal Point's 3-d lithography could lower barrier to MEMS use

Abstract:
Focal Point Microsystems LLC of Tuscon, Ariz., believes its technology ends the quest for cost-effective nanoscale lithography for MEMS devices – an elusive industry Holy Grail. Focal Point is one of a number of companies – including a joint venture by Micronic Laser Systems AB of Sweden and ASML Holding NV of the Netherlands – pursuing maskless lithography for production of microscopic devices.

Source:
SmallTimes

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