Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > ASML, Canon, Nikon take dip into immersion litho

February 28th, 2003

ASML, Canon, Nikon take dip into immersion litho

Abstract:
ASML Holding NV, Canon Inc., and Nikon Corp. separately disclosed they are taking the first steps in what could be the next "breakthrough" in chip production: immersion lithography.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Graphene key to growing 2-dimensional semiconductor with extraordinary properties August 30th, 2016

Continuous roll-process technology for transferring and packaging flexible LSI August 29th, 2016

A nanoscale wireless communication system via plasmonic antennas: Greater control affords 'in-plane' transmission of waves at or near visible light August 27th, 2016

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic