Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > ASML, Canon, Nikon take dip into immersion litho

February 28th, 2003

ASML, Canon, Nikon take dip into immersion litho

Abstract:
ASML Holding NV, Canon Inc., and Nikon Corp. separately disclosed they are taking the first steps in what could be the next "breakthrough" in chip production: immersion lithography.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

New method to generate arbitrary optical pulses January 21st, 2015

New signal amplification process set to transform communications, imaging, computing: UC San Diego researchers discover a mechanism to amplify signals in optoelectronic systems that is far more efficient than standard processes January 21st, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE