Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > News > ASML, Canon, Nikon take dip into immersion litho

February 28th, 2003

ASML, Canon, Nikon take dip into immersion litho

Abstract:
ASML Holding NV, Canon Inc., and Nikon Corp. separately disclosed they are taking the first steps in what could be the next "breakthrough" in chip production: immersion lithography.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Picosun patents ALD nanolaminate to prevent electronics from overheating September 28th, 2016

Researchers at the Catalan Institute of Nanoscience and Nanotechnology show that bending semiconductors generates electricity September 26th, 2016

Mexican scientist in the Netherlands seeks to achieve data transmission ... speed of light September 20th, 2016

Towards Stable Propagation of Light in Nano-Photonic Fibers September 20th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic