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February 25th, 2003
Motorola shows 30-nm images with nano-imprint
Motorola Inc. here today disclosed new details about its internal nano-imprint lithography program, claiming it has demonstrated the ability to print feature sizes down to 30-nm with a tool from a U.S. startup. Douglas Resnick, a manager at Motorola Labs in Tempe, Ariz., said the lab is using a tool from startup Molecular Imprints Inc. (MII, Austin, Texas) to demonstrate the feasibility of nano-imprint lithography in future device production. Last year, MII rolled out a nano-imprint tool geared for sub-100-nm designs.
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