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February 14th, 2003
Stitching accuracy key to Nikon's EPL prototype
Nikon Corp. said it was a breakthrough in sub-field stitching accuracy that allowed the creation of a prototype of its electron-beam projection lithography (EPL) system. The sub-field stitching accuracy, which governs how well a complete die is characterized by several sub-field e-beam exposures, has been described as the main hurdle facing the development of EPL.
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