Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Stitching accuracy key to Nikon's EPL prototype

February 14th, 2003

Stitching accuracy key to Nikon's EPL prototype

Abstract:
Nikon Corp. said it was a breakthrough in sub-field stitching accuracy that allowed the creation of a prototype of its electron-beam projection lithography (EPL) system. The sub-field stitching accuracy, which governs how well a complete die is characterized by several sub-field e-beam exposures, has been described as the main hurdle facing the development of EPL.

Source:
* SiliconStrategies

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Surface matters: Huge reduction of heat conduction observed in flat silicon channels April 23rd, 2015

Drexel materials scientists putting a new spin on computing memory April 22nd, 2015

Printing Silicon on Paper, with Lasers April 21st, 2015

Advances in molecular electronics: Lights on -- molecule on: Researchers from Dresden and Konstanz succeed in light-controlled molecule switching April 20th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project