Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > Ultraviolet Lithography

February 14th, 2003

Ultraviolet Lithography

Abstract:
Ultraviolet lithography can produce lines for integrated circuits as small as 39 nm in one recent test. To help sustain Moore's law and cram more and more gates and memory units into a given space, manufacturers of microchips must make the lines in their circuitry ever smaller.

Source:
AIP

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Researchers Make Magnetic Graphene: UC Riverside research could lead to new multi-functional electronic devices January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE