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Home > News > Extreme Ultraviolet Lithography Reaches Commercial Sector

February 13th, 2003

Extreme Ultraviolet Lithography Reaches Commercial Sector

Abstract:
The Federal Laboratory Consortium for Technology Transfer has granted the Extreme Ultraviolet Lithography (EUVL) project an Excellency in Technology Transfer award for technology that will lead to microprocessors that are tens of times faster than today's most powerful chips.

Source:
SpaceDaily

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