Nanotechnology Now

• About Us
  
  • Advertising
  • Our Mission
  • Our Team
  • Comments
  • Friends
  • Contact
• Nanotechnology
• News
  
  • Current News
  • Press Releases
  • Submit Press
  • Press kit
  • Interviews
• Columns
• Products
  
  • Our Products
  • Books
  • Featured Books
• Directories
  
  • Companies/Academic
  • Events
  • Glossary
  • Best Of
• Career Center
• Nano-Social Network
• Nano Consulting
• My Account

Home > News > Extreme Ultraviolet Lithography Reaches Commercial Sector

February 13th, 2003

Extreme Ultraviolet Lithography Reaches Commercial Sector

Abstract:
The Federal Laboratory Consortium for Technology Transfer has granted the Extreme Ultraviolet Lithography (EUVL) project an Excellency in Technology Transfer award for technology that will lead to microprocessors that are tens of times faster than today's most powerful chips.

Source:
SpaceDaily

Bookmark:

Related News Press

Chip Technology

Researchers Stitch Defects into the World’s Thinnest Semiconductor May 22nd, 2013

Whirlpools on the Nanoscale Could Multiply Magnetic Memory: At the Advanced Light Source, Berkeley Lab scientists join an international team to control spin orientation in magnetic nanodisks May 22nd, 2013

Imec and GLOBALFOUNDRIES collaborate to advance high-density memory technology: STT-MRAM offers enhanced performance and scalability for embedded and standalone applications May 21st, 2013

Penn engineers' nanoantennas improve infrared sensing May 20th, 2013