Nanotechnology Now - Press Release: "Inpria Joins SEMATECH’s Resist Center at UAlbany NanoCollege for Advanced EUV Resist Development "

Home > Press > Inpria Joins SEMATECH’s Resist Center at UAlbany NanoCollege for Advanced EUV Resist Development

Abstract:
SEMATECH, a global consortium of chipmakers, announced today that Inpria, a developer of chemical materials for the deposition of high-performance oxide thin films, has joined SEMATECH's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

Inpria Joins SEMATECH’s Resist Center at UAlbany NanoCollege for Advanced EUV Resist Development

Albany, NY and Corvallis, OR | Posted on April 24th, 2012

As a resist member of SEMATECH's lithography program, Inpria will collaborate with SEMATECH engineers on critical issues for resist in extreme ultraviolet (EUV) lithography. Inpria's inorganic resists have resolved 11 nm line/space features and exhibit extremely high etch resistance. In this collaboration, Inpria and SEMATECH will extend such high-resolution resists to qualify the 0.5 NA EUV imaging optics at the heart of the major upgrades underway to support resist research for 11 nm half-pitch and below in the RMDC facilities. Inpria will also work to increase the photosensitivity of its resist materials to meet productivity requirements for future manufacturing applications.

"Our partnership with SEMATECH provides Inpria the opportunity to rapidly increase the rate of development for our EUV lithography materials," said Andrew Grenville, CEO of Inpria. "We are excited to combine SEMATECH's proven track record operating leading-edge patterning facilities with our experience creating novel chemistries for high-resolution inorganic resist. This collaboration further demonstrates our commitment to tackle the grand challenges in lithography faced by the semiconductor industry."

"We're looking forward to working with Inpria in our mutual effort to develop leading‑edge resists and materials, and accelerate process availability for EUV pilot line manufacturing," said Stefan Wurm, director of Lithography, SEMATECH. "This partnership will help strengthen the RMDC's ability to address critical resist issues in advanced materials and accelerate the search for new solutions to our common technology challenges."

"Further supporting Governor Andrew Cuomo's declaration that New York is open for business, we are delighted to welcome Inpria as the newest global technology partner at CNSE's Albany NanoTech Complex," said Richard Brilla, CNSE vice president for strategy, alliances and consortia. "The critical effort to enable advanced lithographic technologies for manufacturing will be enhanced by the addition of Inpria, which strengthens the CNSE-SEMATECH partnership and New York's recognition as the worldwide hub for nanotechnology innovation and commercialization."

The partnership will be based on SEMATECH's extensive network of hardware and research expertise, semiconductor experience, and highly respected market leadership and on Inpria's transformational semiconductor patterning materials and processes. SEMATECH's RMDC will provide access to two micro-exposure tools (METs) as well as several metrology tools located at the College of Nanoscale Science and Engineering of the University at Albany and the University of California, Berkeley.

At the RMDC, leading resist and materials suppliers participate in focused, cooperative R&D with SEMATECH member companies. Together, the RMDC provides the hardware and research expertise required by materials suppliers and member companies to develop EUV resist processes that meet the stringent resolution, linewidth roughness, and sensitivity specifications needed for EUV insertion at member companies.

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About SEMATECH
SEMATECH®, the international consortium of leading semiconductor device, equipment, and materials manufacturers, this year celebrates 25 years of excellence in accelerating the commercialization of technology innovations into manufacturing solutions. Through our unwavering commitment to foster collaboration across the nanoelectronics industry, we help our members and partners address critical industry transitions, drive technical consensus, pull research into the industry mainstream, improve manufacturing productivity, and reduce risk and time to market. Information about SEMATECH can be found at www.sematech.org.

Twitter: www.twitter.com/sematechnews

About Inpria

Inpria designs and synthesizes solution precursors for the deposition of high-performance inorganic thin films, addressing critical needs in device fabrication and patterning across multiple industries. Our core materials technology provides the unique ability to deposit from solution extremely smooth dense metal oxide films that are directly photopatternable. Working together with our global network of partners, we are committed to developing a new class of electronic materials for the semiconductor industry. Information about Inpria Corporation can be found at www.inpria.com.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience and nanoeconomics. With more than $14 billion in high-tech investments, CNSE represents the world’s most advanced university-driven research enterprise, offering students a one-of-kind academic experience and providing over 300 corporate partners with access to an unmatched ecosystem for leading-edge R&D and commercialization of nanoelectronics and nanotechnology innovations. CNSE’s footprint spans upstate New York, including its Albany NanoTech Complex, an 800,000-square-foot megaplex with the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 85,000 square feet of Class 1 capable cleanrooms. More than 2,700 scientists, researchers, engineers, students and faculty work here, from companies including IBM, Intel, GlobalFoundries, SEMATECH, Samsung, TSMC, Toshiba, Applied Materials, Tokyo Electron, ASML and Novellus Systems. An expansion now underway, part of which will house the world’s first Global 450mm Consortium, will add nearly 500,000 square feet of next-generation infrastructure, an additional 50,000 square feet of Class 1 capable cleanrooms, and more than 1,000 scientists, researchers and engineers from CNSE and global corporations. In addition, CNSE’s Solar Energy Development Center in Halfmoon provides a prototyping and demonstration line for next-generation CIGS thin-film solar cells. CNSE’s Smart Systems Technology and Commercialization Center of Excellence (STC) in Rochester offers state-of-the-art capabilities for MEMS fabrication and packaging. CNSE also co-founded and manages operations at the Computer Chip Commercialization Center at SUNYIT in Utica and is a co-founder of the Nanotechnology Innovation and Commercialization Excelerator in Syracuse. For information, visit www.cnse.albany.edu.

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Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

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